Periodic nanostructures fabricated by Talbot extreme ultraviolet lithography

被引：1

作者：

Li, W. ^{[1
]}

Patel, D. ^{[1
]}

Menoni, C. S. ^{[1
]}

Stein, A. ^{[2
]}

Chao, W. ^{[3
]}

Anderson, E. ^{[3
]}

Marcon, M. C. ^{[1
]}

机构：

[1] Colorado State Univ, NSF Engn Res Ctr Extreme Ultraviolet Sci & Techno, Ft Collins, CO 80523 USA

[2] Center Funct Nano Mat Brookhaven Natl Lab, Upton, NY USA

[3] Center X Ray Optic Lawrence Berkeley Natl Lab, Berkeley, CA 94720 USA

来源：

MICROMACHINING AND MICROFABRICATION PROCESS TECHNOLOGY XIX | 2014年 / 8973卷

关键词：

Extreme ultraviolet; laser; nanostructures; Talbot; table top; PHOTONIC CRYSTALS;

D O I：

10.1117/12.2041688

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A table top nanofabrication system which combines the classic Talbot imaging effect and a compact table top soft-x ray laser is described in this paper. Periodic nanostructures on millimeter square are fabricated using this robust, simple and defect tolerant fabrication method. Talbot lithography allows for a complete coherent extreme ultraviolet lithography process in a compact table top system. Double exposure allowed for the reduction of the feature sizes.

引用

页数：5

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