Change in planar hall effect ratio of Ni-Co films produced by electrodeposition

被引：2

作者：

Karpuz, Ali ^{[1
]}

Kockar, Hakan ^{[1
]}

Alper, Mursel ^{[2
]}

机构：

[1] Balikesir Univ, Sci & Literature Fac, Dept Phys, TR-10145 Balikesir, Turkey

[2] Uludag Univ, Sci & Literature Fac, Dept Phys, TR-16059 Bursa, Turkey

来源：

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 2015年 / 373卷

关键词：

Anisotropic magnetoresistance; Magnetoresistance; Ni-Co film; Planar Hall effect; ANISOTROPIC MAGNETORESISTANCE; THIN-FILMS; EXTRAORDINARY MAGNETORESISTANCE; GIANT MAGNETORESISTANCE; ROOM-TEMPERATURE; IMPURITY LAYERS; MULTILAYERS; FIELD; OPTIMIZATION; COMPOSITES;

D O I：

10.1016/j.jmmm.2014.01.067

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Ni-Co Films were produced by the electrodeposition technique and their magnetotransport properties were studied. The anisotropic magnetoresistance (AMR) and the planar Hall effect (PRE) ratios were Found using the van der Pauw setup at room temperature. It was observed that the ORE ratios were larger than the obtained AMR ratios. While the maximum changes in longitudinal and transversal magnetoresistance ratios were 6.8% and 140%, respectively, the change in ORE values was up to 500%. In the ORE measurements, the magnetoresistance orientation depends on the electrical resistance values which occur in branches of the films. (C) 2014 Elsevier B.V. All rights reserved.

引用

页码：115 / 119

页数：5

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