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Electrical current-induced gradual failure of crystalline Ge2Sb2Te5 for phase-change memory
被引:21
|作者:
Park, Yong-Jin
[1
]
Yang, Tae-Youl
[1
]
Cho, Ju-Young
[1
]
Lee, So-Yeon
[1
]
Joo, Young-Chang
[1
]
机构:
[1] Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South Korea
关键词:
THIN-FILMS;
AMORPHIZATION;
D O I:
10.1063/1.4818684
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
Electrical failure in crystalline Ge2Sb2Te5 was observed under a direct current bias, which induces a steady degradation of the electrical conductivity. This failure is induced by electromigration because alternating current bias stressing does not trigger this behavior. Nano-scaled voids were generated during current stressing, which explains the gradual increase in the quantitative resistance. Each nano-void previously comprised a molten phase that was induced by localized melting, which produced compositional variation during the solidification process. The phase-change memory can be damaged by electrical stressing in the non-active regions. (C) 2013 AIP Publishing LLC.
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页数:4
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