Electrical current-induced gradual failure of crystalline Ge2Sb2Te5 for phase-change memory

被引:21
|
作者
Park, Yong-Jin [1 ]
Yang, Tae-Youl [1 ]
Cho, Ju-Young [1 ]
Lee, So-Yeon [1 ]
Joo, Young-Chang [1 ]
机构
[1] Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South Korea
关键词
THIN-FILMS; AMORPHIZATION;
D O I
10.1063/1.4818684
中图分类号
O59 [应用物理学];
学科分类号
摘要
Electrical failure in crystalline Ge2Sb2Te5 was observed under a direct current bias, which induces a steady degradation of the electrical conductivity. This failure is induced by electromigration because alternating current bias stressing does not trigger this behavior. Nano-scaled voids were generated during current stressing, which explains the gradual increase in the quantitative resistance. Each nano-void previously comprised a molten phase that was induced by localized melting, which produced compositional variation during the solidification process. The phase-change memory can be damaged by electrical stressing in the non-active regions. (C) 2013 AIP Publishing LLC.
引用
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页数:4
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