Partially and fully cured thin film photoresist waveguides for integrated optics

被引：8
作者：
Arun, G [1 ]
Sharma, VK [1 ]
Kapoor, A [1 ]
Tripathi, KN [1 ]
机构：
[1] Univ Delhi, Dept Elect Sci, New Delhi 110021, India
来源：
OPTICS AND LASER TECHNOLOGY | 2002年 / 34卷 / 05期
关键词：
photoresist; waveguide; dispersion;
D O I：
10.1016/S0030-3992(02)00035-X
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
A systematic and detailed study of waveguide fabrication and characterization of a commercially available (from Shipley) photoresist is reported. Various waveguide properties such as refractive index, optical losses, waveguide thickness, dispersion and birefringence are reported. Effect of temperature of guide formation, curing (partial and full) and UV exposure on these parameters is also presented. (C) 2002 Published by Elsevier Science Ltd.
引用
收藏
页码：395 / 398
页数：4
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