Preparation of photo-induced refractive index pattern using polysilane-silica hybrid thin films

被引：24

作者：

Matsukawa, K

Katada, K

Nishioka, N

Matsuura, Y

Inoue, H

机构：

[1] Osaka Municipal Tech Res Inst, Joto Ku, Osaka 5368553, Japan

[2] Osaka Electrocommun Univ, Fac Engn, Neyagawa, Osaka 5728530, Japan

来源：

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2004年 / 17卷 / 01期

关键词：

polysilane; refractive index; organic-inorganic hybrid; thin film;

D O I：

10.2494/photopolymer.17.51

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

引用

页码：51 / 52

页数：2

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