In situ infrared spectroscopy during La2O3 atomic layer deposition using La(iPrCp)3 and H2O

被引：3

作者：

Sperling, Brent A. ^{[1
]}

Maslar, James E. ^{[1
]}

Ivanov, Sergei V. ^{[2
]}

机构：

[1] NIST, 100 Bur Dr, Gaithersburg, MD 20899 USA

[2] Versum Mat, 7201 Hamilton Blvd, Allentown, PA 18195 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2018年 / 36卷 / 03期

关键词：

OXIDE THIN-FILMS; LANTHANUM OXIDE; GATE OXIDES; VIBRATIONAL SPECTROSCOPY; EMISSION SPECTROSCOPY; ELECTRICAL-PROPERTIES; DEHYDROXYLATION; PRECURSOR; SPECTRA; POWDERS;

D O I：

10.1116/1.5026488

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Infrared spectra of surface species have been obtained during atomic layer deposition using tris(isopropylcyclopentadienyl) lanthanum, La((PrCp)-Pr-i)(3), and water as precursors at 160 and 350 degrees C. Gas-phase spectra of La((PrCp)-Pr-i)(3) are obtained for comparison. At low temperature, ligand exchange is seen to occur, and carbonate formation is found. With extended purging, the organic ligands are found to be stable on the surface, and carbonates are not formed. These observations indicate that carbonate formation is occurring during exposure to the precursors. At high temperature, the La precursor is observed to decompose leaving an opaque deposit containing relatively little hydrogen.

引用

页数：5

共 37 条

[1] Lanthanum titanate and lithium lanthanum titanate thin films grown by atomic layer deposition [J].