Effect of Internal Antenna Coil Power on the Plasma Parameters in 13.56 MHz/60 MHz Dual-Frequency Sputtering

被引：3

作者：

Huang Fupei ^{[1
]}

Yang Chicheng ^{[2
]}

Ye Chao ^{[1
]}

Ge Shuibing ^{[1
]}

Ning Zhaoyuan ^{[1
]}

机构：

[1] Suzhou Univ, Sch Phys Sci & Technol, Jiangsu Key Lab Thin Film, Suzhou 215006, Peoples R China

[2] Natl Tsing Hua Univ, Dept Phys, Hsinchu 30013, Taiwan

来源：

PLASMA SCIENCE & TECHNOLOGY | 2013年 / 15卷 / 12期

基金：

中国国家自然科学基金;

关键词：

hybrid ICP/sputtering discharge; plasma property; ZIRCONIUM-OXIDE FILMS; RF PLASMA; DEPOSITION;

D O I：

10.1088/1009-0630/15/12/07

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

The plasma property of a hybrid ICP/sputtering discharge driven by 13.56 MHz/60 MHz power sources was investigated by Langmuir probe measurement. For the pure sputtering discharge, the low electron density and ion flux, the rise of floating potential and plasma potential with increasing power, as well as the bi-Maxwellian distribution of electron energy distributions (EEDFs) were obtained. The assistance of ICP discharge led to the effective increases of electron density and ion flux, the suppression of rise of floating potential and plasma potential, as well as the change of EEDFs from bi-Maxwellian distribution into Maxwellian distribution. The increase of electron density and ion flux, and the EEDFs evolution were related to the effective electron heating by the induced electric field.

引用

页码：1197 / 1202

页数：6

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