Properties of amorphous carbon films synthesized by atmospheric pressure glow plasma CVD method

Amorphous carbon films were synthesized on top of polyethylene terephthalate (PET) substrates using atmospheric-pressure glow (APG) plasma CVD equipment which we originally designed and set up. Plasma was gene,rated between two metal electrodes one of which was covered with a dielectric plate. By varying dielectric constant of the plate. the deposition rate of the carbon films was controlled. From the oxygen transmission test, the resulting PET coated with thin carbon films exhibited high gas barrier property. Using the material with high dielectric constant, we finally synthesized a nearly complete gas barrier films at the deposition rate of 15 sec.