Distribution of carbon in polycrystalline copper surfaces treated by methane plasma immersion ion implantation

被引：6

作者：

Flege, S. ^{[1
]}

Kraft, G. ^{[1
]}

Baba, K. ^{[2
]}

Hatada, R. ^{[1
,2
]}

Ensinger, W. ^{[1
]}

机构：

[1] Tech Univ Darmstadt, Dept Mat Sci, Darmstadt, Germany

[2] Ind Technol Ctr Nagasaki, Appl Technol Div, Nagasaki, Japan

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2009年 / 267卷 / 8-9期

关键词：

Plasma immersion ion implantation; SIMS; EPMA; TANTALUM; TITANIUM;

D O I：

10.1016/j.nimb.2009.01.126

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Copper substrates with rather large grains (dimensions of some mm) treated by pulsed methane plasma immersion ion implantation exhibit a laterally inhomogeneous carbon distribution. Areas with high carbon X-ray intensity in electron probe microanalysis coincide with thicker carbon containing layers as seen in sputter depth profiling via secondary ion mass spectrometry. The distribution of carbon within the surface depends not only on the treatment time and pulse repetition rate but also on the orientation of the individual copper grains. (C) 2009 Elsevier B.V. All rights reserved.

引用

页码：1531 / 1535

页数：5

共 8 条

[1]

Anders A., 2000, HDB PLASMA IMMERSION

[2] Formation of thin carbide films of titanium and tantalum by methane plasma immersion ion implantation [J].