Electronic structure, optical properties, and lattice dynamics in atomically thin indium selenide flakes

被引:163
|
作者
Sanchez-Royo, Juan F. [1 ]
Munoz-Matutano, Guillermo [1 ]
Brotons-Gisbert, Mauro [1 ]
Martinez-Pastor, Juan P. [1 ]
Segura, Alfredo [1 ,2 ]
Cantarero, Andres [1 ]
Mata, Rafael [1 ]
Canet-Ferrer, Josep [1 ]
Tobias, Gerard [3 ]
Canadell, Enric [3 ]
Marques-Hueso, Jose [4 ]
Gerardot, Brian D. [4 ]
机构
[1] Univ Valencia, Inst Ciencia Mat, ICMUV, Valencia 46071, Spain
[2] Univ Valencia, Inst Ciencia Mat, Dept Fis Aplicada, MALTA Consolider Team, E-46100 Burjassot, Valencia, Spain
[3] CSIC, Inst Ciencia Mat Barcelona ICMAB, Barcelona 08193, Spain
[4] Heriot Watt Univ, SUPA, Inst Photon & Quantum Sci, Edinburgh EH14 4AS, Midlothian, Scotland
基金
英国工程与自然科学研究理事会; 欧洲研究理事会;
关键词
indium selenide; two-dimensional flakes; micro-Raman spectroscopy; micro-photoluminescence; electronic structure; HIGH-PERFORMANCE; SEMICONDUCTING GRAPHENE; PHOTOVOLTAIC PROPERTIES; VALLEY POLARIZATION; POPULATION ANALYSIS; RAMAN-SCATTERING; LARGE-AREA; LAYER; INSE; MOS2;
D O I
10.1007/s12274-014-0516-x
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The progressive stacking of chalcogenide single layers gives rise to two-dimensional semiconducting materials with tunable properties that can be exploited for new field-effect transistors and photonic devices. Yet the properties of some members of the chalcogenide family remain unexplored. Indium selenide (InSe) is attractive for applications due to its direct bandgap in the near infrared, controllable p- and n-type doping and high chemical stability. Here, we reveal the lattice dynamics, optical and electronic properties of atomically thin InSe flakes prepared by micromechanical cleavage. Raman active modes stiffen or soften in the flakes depending on which electronic bonds are excited. A progressive blue-shift of the photoluminescence peaks is observed for decreasing flake thickness (as large as 0.2 eV for three single layers). First-principles calculations predict an even larger increase in the bandgap, 0.40 eV, for three single layers, and as much as 1.1 eV for a single layer. These results are promising from the point of view of the versatility of this material for optoelectronic applications at the nanometer scale and compatible with Si and III-V technologies.
引用
收藏
页码:1556 / 1568
页数:13
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