RF planar coil inductively coupled plasma system for surface coating and modification

被引：0

作者：

Kok, YC ^{[1
]}

Wong, CS ^{[1
]}

Ng, KH ^{[1
]}

Chakrabarty, CK ^{[1
]}

Idris, A ^{[1
]}

机构：

[1] Univ Malaya, Fac Sci, Dept Phys, Plasma Res Lab, Kuala Lumpur 50603, Malaysia

来源：

PROCESSING AND FABRICATION OF ADVANCED MATERIALS VI, VOLS 1 & 2 | 1998年

关键词：

RF planar coil inductively coupled plasma; plasma processing; TiN film;

D O I：

暂无

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A RF driven planar coil inductively coupled plasma source (ICPS) for plasma processing was designed and constructed. The ICPS is powered by a 600 W, 13.56 MHz RF generator with 50 Omega output impedance tuned with a pi-network. The discharge can be tuned to either the E-mode or the I-I-mode operation. Particularly, in II-mode operation, a uniform disc plasma of high temperature (several eV) and high density (> 10(9) cm(-3)) can be obtained. The application of this ICPS in the nitriding of AISI 316 stainless steel has been demonstrated. Possible setup for the further application of this system to coat TIN film will also be discussed in this paper.

引用

页码：1083 / 1089

页数：7

共 10 条

[1] TRANSFORMER COUPLED PLASMA ETCH TECHNOLOGY FOR THE FABRICATION OF SUBHALF MICRON STRUCTURES
CARTER, JB
HOLLAND, JP
PELTZER, E
RICHARDSON, B
BOGLE, E
NGUYEN, HT
MELAKU, Y
GATES, D
BENDOR, M
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (04): : 1301 - 1306
[2] LANGMUIR PROBE MEASUREMENTS OF A RADIO-FREQUENCY INDUCTION PLASMA
HOPWOOD, J
GUARNIERI, CR
WHITEHAIR, SJ
CUOMO, JJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (01): : 152 - 156
[3] ILIC DB, 1981, REV SCI INSTRUM, V52, P1542, DOI 10.1063/1.1136465
[4] The effects of magnetic fields on a planar inductively coupled argon plasma
Lee, HJ
Yang, ID
Whang, KW
[J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 1996, 5 (03) : 383 - 388
[5] Laboratory measurements and optimization of inductively coupled loop antenna plasma sources
Menard, J
Intrator, T
[J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 1996, 5 (03) : 363 - 370
[6] MODELING AND INDUCTIVELY-COUPLED PLASMA SOURCE
PARANJPE, AP
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1994, 12 (04): : 1221 - 1228
[7] APPLICATION OF A HIGH-DENSITY INDUCTIVELY-COUPLED PLASMA REACTOR TO POLYSILICON ETCHING
PATRICK, R
SCHOENBORN, P
TODA, H
BOSE, F
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (04): : 1296 - 1300
[8] A simple analysis of an inductive RF discharge
Piejak, R. B.
Godyak, V. A.
Alexandrovich, B. M.
[J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 1992, 1 (03) : 179 - 186
[9] GATE ELECTRODE ETCHING USING A TRANSFORMER COUPLED PLASMA
YOSHIDA, K
MIYAMOTO, H
IKAWA, E
MURAO, Y
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (4B): : 2089 - 2094
[10] LARGE-AREA RADIO-FREQUENCY PLASMA FOR MICROELECTRONICS PROCESSING
YU, Z
SHAW, D
GONZALES, P
COLLINS, GJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1995, 13 (03): : 871 - 874

← 1 →