Performance enhancement in chemical vapor deposition graphene field-effect transistors by high-κ dielectric screening

被引:13
作者
Wang, Zegao [1 ]
Chen, Yuanfu [1 ]
Li, Pingjian [1 ]
Liu, Jingbo [1 ]
Tian, Hongjun [1 ]
Qi, Fei [1 ]
Zheng, Binjie [1 ]
Zhou, Jinhao [1 ]
机构
[1] Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Peoples R China
基金
中国国家自然科学基金;
关键词
Graphene; High-kappa Dielectric; Screening; Raman Spectroscopy; Chemical Vapor Deposition; DOPED GRAPHENE; FILMS; TRANSPORT; MOBILITY;
D O I
10.1166/mex.2014.1146
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The transport properties of CVD graphene-based field-effect transistors (GFETs) before and after introducing high-k dimethyl sulfoxide (DMSO) were investigated. The results show that after introducing DMSO, the performance of GFETs was significantly improved: the maximum drain current I-Dmax, the maximum transconductance g(mmax), and the field-effect mobility increase by 2.5, 24, and 23 times, respectively. The mechanism for the performance enhancement by high-k dielectric was analyzed by Raman spectroscopy and transport measurements, and both are consistent with each other.
引用
收藏
页码:85 / 89
页数:5
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