Structural and Optical Properties of Oxygen Irradiated Zn1-xMgxO (x=0, 0.2) Thin Films

被引:0
作者
Kumar, Parmod [1 ]
Malik, Hitendra K. [1 ]
Asokan, K. [2 ]
机构
[1] Indian Inst Technol Delhi, Dept Phys, New Delhi 110016, India
[2] Inter Univ Accelerator Ctr, Div Mat Sci, New Delhi 110067, India
来源
PROCEEDINGS OF THE 59TH DAE SOLID STATE PHYSICS SYMPOSIUM 2014 (SOLID STATE PHYSICS) | 2015年 / 1665卷
关键词
ZnO thin films; sputtering deposition; XRD; optical properties;
D O I
10.1063/1.4918141
中图分类号
O59 [应用物理学];
学科分类号
摘要
In the present study we report the effect of oxygen ion beam irradiation on the structural and optical properties of pure and 20% Mg doped ZnO thin films. These films were grown on Si substrate using RF sputtering technique. X-ray diffraction study confirms the formation of hexagonal wurtzite phase and the lattice parameter is found to reduce by Mg incorporation which further decreases after irradiation. The optical properties of the thin films using UV-Vis spectroscopy technique indicate an increment in the optical band gap with Mg incorporation as well as after irradiation.
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页数:2
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