High-resolution EUV Microstepper tool for resist testing & technology evaluation

被引：11

作者：

Brunton, A ^{[1
]}

Cashmore, J ^{[1
]}

Elbourn, P ^{[1
]}

Elliner, G ^{[1
]}

Gower, M ^{[1
]}

Grünewald, P ^{[1
]}

Harman, M ^{[1
]}

Hough, S ^{[1
]}

McEntee, N ^{[1
]}

Mundair, S ^{[1
]}

Rees, D ^{[1
]}

Richards, P ^{[1
]}

Truffert, V ^{[1
]}

Wallhead, I ^{[1
]}

Whitfield, M ^{[1
]}

机构：

[1] Exitech Ltd, Oxford OX5 1QU, England

来源：

EMERGING LITHOGRAPHIC TECHNOLOGIES VIII | 2004年 / 5374卷

关键词：

EUV lithography; Microsteppers;

D O I：

10.1117/12.548343

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Key features are presented of the Exitech MS-13 EUV Microstepper tool developed for EUV resist testing & technology evaluation at the 32nm node and beyond. Details of the tool design architecture, module layout, vacuum chamber, major subsystems including source, optics and performance specifications are given.

引用

页码：869 / 880

页数：12