Optical constants in the EUV Soft x-ray (5 ÷ 152 nm) spectral range of B4C thin films deposited by different deposition techniques

被引：8

作者：

Monaco, G. ^{[1
]}

Garoli, D. ^{[1
]}

Frison, R. ^{[1
]}

Mattarello, V. ^{[1
]}

Nicolosi, P. ^{[1
]}

Pelizzo, M. G. ^{[1
]}

Rigato, V. ^{[1
]}

Armelao, L. ^{[1
]}

Giglia, A. ^{[1
]}

Nannarone, S. ^{[1
]}

机构：

[1] Univ Padua, CNR, INFM, Luxor Lab,DEI, Via Gradenigo 6-B, I-35131 Padua, Italy

来源：

ADVANCES IN X-RAY/EUV OPTICS, COMPONENTS, AND APPLICATIONS | 2006年 / 6317卷

关键词：

B4C; optical coatings; multilayer; optical constants; EUV Soft-X; PLD; e-beam; magnetron sputtering;

D O I：

10.1117/12.684088

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

B4C optical coating represents, together with Ir, Pt, SiC, one of best choice for high reflectance in the extreme ultraviolet region (EUV 160-30 nm). This material is also used in multilayer for soft X-ray applications, such as Si/B4C or W/B4C, or as interlayer in Mo/Si multilayer to avoid interdiffusion also because of its high thermal stability. Our work concerns on B4C thin films deposited on Si [100] substrates by means of three different deposition techniques: RF plasma magnetron sputtering, e-beam evaporation, pulsed laser ablation (PLD). We performed reflectance vs incidence angle measurements from 5 nm to 152 nm on different samples deriving the optical constants with a least-square fitting method. Complete films characterization have been carried out with compositional (XPS), structural (XRD) and morphological (AFM, SEM) analyses.

引用

页数：12

共 24 条

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