Ablation and surface modifications of PMMA using a laser-plasma EUV source

Surface modification and micro-structuring of polymers for different application is mainly performed using ultraviolet (UV) radiation from excimer lamps or excimer lasers. In this case, however, the radiation penetration depth may exceed 100 mu m, thereby degrading the polymer deep inside. On the other hand, extreme ultraviolet (EUV) radiation is absorbed in a layer approximately 100 nm thick only. In this work, the radiation from a laser-plasma EUV source based on a double-stream gas-puff target is focused with a gold-coated ellipsoidal collector for surface modification of polymethylmethacrylate (PMMA). The spectrum of the focused radiation consists of a narrow feature with maximum at 10 nm and a long-wavelength tail up to 70 nm. The PMMA samples are mounted in the focal plane of the EUV collector or at some distance downstream this plane and irradiated for 10-60 s with 10-Hz repetition rate. The irradiated polymer samples were investigated using a scanning electron microscope. When the EUV fluence exceeds 10 mJ/cm(2), smooth ablation of PMMA was obtained. For lower fluences but close to this value, strong surface modifications appeared.