Diffraction gratings of photosensitive ZrO2 gel films fabricated with the two-ultraviolet-beam interference method

被引：51

作者：

Kintaka, K

Nishii, J

Tohge, N

机构：

[1] Agcy Ind Sci & Technol, Osaka Natl Res Inst, Dept Opt Mat, Osaka 5638577, Japan

[2] Kinki Univ, Fac Sci & Engn, Dept Met Engn, Osaka 5778502, Japan

来源：

APPLIED OPTICS | 2000年 / 39卷 / 04期

关键词：

D O I：

10.1364/AO.39.000489

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Photosensitive ZrO2 gel films we:re patterned with a two-beam interference method by use of a 325-nm-wavelength He-Cd laser for the first time to our knowledge. The ZrO2 gel films were prepared from Zr(O-n-C4H9)(4) chemically modified with benzoylacetone. We fabricated uniform gratings with a 0.5-mu m period on Si or SiO2 substrates by etching the gel films in ethyl alcohol after UV irradiation. A maximum diffraction efficiency of 28% was attained with the grating fabricated on Si substrate under a Littrow mounting condition by use of a 633-nm-wavelength He-Ne laser. Blazed gratings could also be fabricated. (C) 2000 Optical Society of America.

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页码：489 / 493

页数：5

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