Photopatterning of PEDOT Derivatives with Photoacid Generators and Acid Amplifiers Generating Polystyrenesulfonic Acid

被引：3

作者：

Arimitsu, Koji ^{[1
]}

Hiraga, Eishiro ^{[1
]}

Furutani, Masahiro ^{[1
]}

机构：

[1] Tokyo Univ Sci, Dept Pure & Appl Chem, 2641 Yamazaki, Noda, Chiba 2788510, Japan

来源：

ACS APPLIED POLYMER MATERIALS | 2019年 / 1卷 / 05期

关键词：

PEDOT-PSS; acid amplifier; photopatterning; dry process; photoacid generator; CONDUCTING POLYMERS; ELECTRODES; DEVICES;

D O I：

10.1021/acsapm.9b00052

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Photopatteming of PEDOT-PSS is desired but troublesome due to the insolubility of PEDOT and no alternatives of generating PSS in the film. We synthesized acid amplifiers (AAs) that can generate PSS autocatalytically. The AAs increase the concentration of PSS, with a catalytic amount of acids from PAGs. Furthermore, we used PEDOT-PEGs (PEDOT:polyethylene glycols) that disperse easily in organic solvents. By using these AAs, PEDOT-PEGs, and PAGs, we obtained photopatterns of PEDOT-PSS in a dry process. The obtained patterns had high transparency as well as a 10(6) order of difference in conductivity between the exposed (semiconductor) and unexposed (insulator) parts.

引用

页码：924 / 927

页数：7

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