This study demonstrates that carbon tetrafluoride (CF4) plasma can result in relatively hydrophobic and hydrophilic surfaces formed in-situ on polyimide (PI) films using a mask and controlling the distance of the mask to the substrate. The surface properties of plasma-treated PI films are characterized by contact angle measurement, atomic force microscopy (AFM), and X-ray photoelectron spectroscopy (XPS). Under specific modification conditions, contact angles for hydrophobic and hydrophilic surfaces reach values of 108.3 +/- 0.6 degrees and below 5 degrees, respectively. The XPS analyses indicate that the "unshielded" surfaces contained a high proportion of the CF2-CF2 group and therefore decreased the wettability of the surface. On the other hand, the "shielded" surface contained hydrophilic groups such as carbonyl or carboxyl with few fluorinated groups, resulting in increased wettability of the surface. (C) 2009 Elsevier B.V. All rights reserved.
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Sungkyunkwan Univ, Dept Mech Engn, Suwon 16419, South KoreaSungkyunkwan Univ, Dept Mech Engn, Suwon 16419, South Korea
Lee, Jaehyun
Hwang, Sangyeon
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Sungkyunkwan Univ, Dept Mech Engn, Suwon 16419, South KoreaSungkyunkwan Univ, Dept Mech Engn, Suwon 16419, South Korea
Hwang, Sangyeon
Cho, Dae-Hyun
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Sungkyunkwan Univ, Dept Mech Engn, Suwon 16419, South KoreaSungkyunkwan Univ, Dept Mech Engn, Suwon 16419, South Korea
Cho, Dae-Hyun
Hong, Jungwoo
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Korea Adv Inst Sci & Technol, Grad Med Sci & Engn, Dept Mech Engn, Daejeon 34141, South KoreaSungkyunkwan Univ, Dept Mech Engn, Suwon 16419, South Korea
Hong, Jungwoo
Shin, Jennifer H.
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Korea Adv Inst Sci & Technol, Grad Med Sci & Engn, Dept Mech Engn, Daejeon 34141, South KoreaSungkyunkwan Univ, Dept Mech Engn, Suwon 16419, South Korea
Shin, Jennifer H.
Byun, Doyoung
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Sungkyunkwan Univ, Dept Mech Engn, Suwon 16419, South KoreaSungkyunkwan Univ, Dept Mech Engn, Suwon 16419, South Korea
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Toshiba Co Ltd, Corp Mfg Engn Ctr, Yokohama, Kanagawa 2350017, Japan
Chiba Univ, Grad Sch Sci & Technol, Div Qual Mat Sci, Chiba 2638522, JapanToshiba Co Ltd, Corp Mfg Engn Ctr, Yokohama, Kanagawa 2350017, Japan
Tohno, Ichiro
Ikagawa, Masakuni
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Toshiba Co Ltd, Corp Mfg Engn Ctr, Yokohama, Kanagawa 2350017, JapanToshiba Co Ltd, Corp Mfg Engn Ctr, Yokohama, Kanagawa 2350017, Japan
Ikagawa, Masakuni
Shinmura, Tadashi
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Toshiba Co Ltd, Corp Mfg Engn Ctr, Yokohama, Kanagawa 2350017, JapanToshiba Co Ltd, Corp Mfg Engn Ctr, Yokohama, Kanagawa 2350017, Japan
Shinmura, Tadashi
Kataoka, Yoshinori
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Toshiba Co Ltd, Corp Mfg Engn Ctr, Yokohama, Kanagawa 2350017, JapanToshiba Co Ltd, Corp Mfg Engn Ctr, Yokohama, Kanagawa 2350017, Japan
Kataoka, Yoshinori
Okudaira, Koji
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Chiba Univ, Grad Sch Adv Integrat Sci, Chiba 2638522, JapanToshiba Co Ltd, Corp Mfg Engn Ctr, Yokohama, Kanagawa 2350017, Japan
Okudaira, Koji
Ueno, Nobuo
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Chiba Univ, Grad Sch Adv Integrat Sci, Chiba 2638522, JapanToshiba Co Ltd, Corp Mfg Engn Ctr, Yokohama, Kanagawa 2350017, Japan
Ueno, Nobuo
Sugita, Kazuyuki
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Chiba Univ, Grad Sch Sci & Technol, Div Qual Mat Sci, Chiba 2638522, JapanToshiba Co Ltd, Corp Mfg Engn Ctr, Yokohama, Kanagawa 2350017, Japan