Diamond-like carbon coatings: AFM and ellipsometric studies

被引:33
作者
Pandey, M [1 ]
Bhatacharyya, D
Patil, DS
Ramachandran, K
Venkatramani, N
机构
[1] Bhabha Atom Res Ctr, Synchrotron Radiat Sect, Bombay 400085, Maharashtra, India
[2] Bhabha Atom Res Ctr, Div Spect, Bombay 400085, Maharashtra, India
[3] Bhabha Atom Res Ctr, Div Laser & Plasma Technol, Bombay 400085, Maharashtra, India
关键词
chemical vapour deposition; diamond-like carbon coatings; atomic force microscopy; ellipsometry;
D O I
10.1016/S0257-8972(03)00876-4
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Diamond-like carbon (DLC) films deposited by the microwave plasma CVD technique under varying bias voltages are investigated using atomic force microscopy (AFM) and spectroscopic ellipsometry. AFM investigations are used to study the surface morphology, while the ellipsometric studies are used to study the variation in the density and the sp(3)/sp(2) ratio of these films. The surface morphology, density and sp(3)/sp(2) ratio of these films are related to each other and follow the sub-plantation model. The DLC films deposited at low bias voltages ( -100 V to - 300 V) show an increase in the density with increases in bias voltage. The films deposited in high bias voltage range (approx. - 800 V to - 1400 V), however, show saturation in their density. The sp(3)/sp(2) ratio is also found to increase with increase in bias voltage, but only up to a certain limit (approx. - 1000 V) beyond which its value decreases. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:24 / 34
页数:11
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