Near-Infrared Detection Using Pulsed Tunneling Junction in Silicon Devices

被引:2
作者
Kim, HuiJung [1 ]
Choi, Seongwook [1 ]
Yoo, Nakwon [1 ]
Lee, Myoung Jin [2 ]
Park, Young June [1 ]
机构
[1] Seoul Natl Univ, Dept Elect & Comp Engn, Seoul 151742, South Korea
[2] Chonnam Natl Univ, Sch Elect & Comp Engn, Kwangju 500757, South Korea
关键词
Avalanche multiplication; Frantz-Keldysh effect (FKE); gate-induced drain leakage (GIDL); infrared detection; nMOS tunneling; pulse measurement; Zener diode; AVALANCHE BREAKDOWN; OPTICAL-ABSORPTION; LEAKAGE CURRENT; MOSFET; LIGHT; GE; PHOTODETECTOR; PHOTODIODES; OPERATION; MODEL;
D O I
10.1109/TED.2015.2497265
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We exploit the potential of the pulsed tunneling bias condition in silicon junctions (the Zener junction and the drain surface junction in nMOSFETs) to detect near-infrared (NIR) photon signals. A combination of the Franz-Keldysh effect and avalanche multiplication with minimization of the thermal effect through a pulsed tunneling bias is found to provide infrared radiation sensitivities as high as 1.18 and 0.89 A/W at the wavelengths of 1310 and 1550 nm, respectively, in a Zener diode. The potential of the drain surface junction in MOSFETs to function as an NIR sensor is also investigated using a similar bias scheme.
引用
收藏
页码:377 / 383
页数:7
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