机构:
Univ Bordeaux, IMS, CNRS UMR 5218, F-33405 Talence, FranceUniv Toulouse, LAAS CNRS, F-31031 Toulouse, France
Rzin, M.
[2
]
Brunel, L.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Bordeaux, IMS, CNRS UMR 5218, F-33405 Talence, France
United Monolith Semicond, F-91140 Villebon Sur Yvette, FranceUniv Toulouse, LAAS CNRS, F-31031 Toulouse, France
Brunel, L.
[2
,4
]
Curutchet, A.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Bordeaux, IMS, CNRS UMR 5218, F-33405 Talence, FranceUniv Toulouse, LAAS CNRS, F-31031 Toulouse, France
Curutchet, A.
[2
]
Malbert, N.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Bordeaux, IMS, CNRS UMR 5218, F-33405 Talence, FranceUniv Toulouse, LAAS CNRS, F-31031 Toulouse, France
Malbert, N.
[2
]
Labat, N.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Bordeaux, IMS, CNRS UMR 5218, F-33405 Talence, FranceUniv Toulouse, LAAS CNRS, F-31031 Toulouse, France
Labat, N.
[2
]
Carisetti, D.
论文数: 0引用数: 0
h-index: 0
机构:
Thales Res & Technol, F-91767 Palaiseau, FranceUniv Toulouse, LAAS CNRS, F-31031 Toulouse, France
Carisetti, D.
[3
]
Lambert, B.
论文数: 0引用数: 0
h-index: 0
机构:
United Monolith Semicond, F-91140 Villebon Sur Yvette, FranceUniv Toulouse, LAAS CNRS, F-31031 Toulouse, France
Lambert, B.
[4
]
Mermoux, M.
论文数: 0引用数: 0
h-index: 0
机构:
UMR 5279 CNRS, LEPMI, F-38402 St Martin Dheres, FranceUniv Toulouse, LAAS CNRS, F-31031 Toulouse, France
The study of the pulsed drain current or noise characteristics in AlGaN/GaN HEMTs is the key of knowledge for designing the power amplifiers, the low noise amplifiers and the oscillators or mixers, but it is well accepted today that this study is not fully accomplished without pointing on the effect of the gate leakage current; It is obvious that the transistor's leakage current may disturb its operation at high power and high frequency. Leakage currents studies are also an area of great importance in optimization of safe operating area and reliability of HEMTs. Therefore, room temperature pulsed I-V and low frequency noise measurements of gate and drain currents of AlGaN/GaN HEMTs have been investigated under different bias conditions on two devices showing identical drain current and different gate current levels. The results show a correlation between two non-destructive measurement techniques applied on devices under test. (C) 2013 Elsevier Ltd. All rights reserved.
机构:
Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Dev, Chengdu 610054, Peoples R ChinaUniv Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Dev, Chengdu 610054, Peoples R China
Wang, Xiaoming
Chen, Wanjun
论文数: 0引用数: 0
h-index: 0
机构:
Univ Electronic Sci & Technol China, State Key Lab Electron Thin Films & Integrated Dev, Chengdu 610054, Peoples R China
Inst Elect & Informat Engn UESTC Guangdong, Dongguan 523808, Peoples R ChinaUniv Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Dev, Chengdu 610054, Peoples R China
Chen, Wanjun
Sun, Ruize
论文数: 0引用数: 0
h-index: 0
机构:
Univ Electronic Sci & Technol China, State Key Lab Electron Thin Films & Integrated Dev, Chengdu 610054, Peoples R ChinaUniv Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Dev, Chengdu 610054, Peoples R China
Sun, Ruize
Liu, Chao
论文数: 0引用数: 0
h-index: 0
机构:
Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Dev, Chengdu 610054, Peoples R ChinaUniv Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Dev, Chengdu 610054, Peoples R China
Liu, Chao
Chen, Xinghuan
论文数: 0引用数: 0
h-index: 0
机构:
China Elect Prod Reliabil & Environmental Testing, Guangzhou 510610, Peoples R ChinaUniv Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Dev, Chengdu 610054, Peoples R China
Chen, Xinghuan
Xia, Yun
论文数: 0引用数: 0
h-index: 0
机构:
Shenzhen Pinghu Lab, Shenzhen 518111, Peoples R ChinaUniv Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Dev, Chengdu 610054, Peoples R China
Xia, Yun
Xu, Xiaorui
论文数: 0引用数: 0
h-index: 0
机构:
Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R ChinaUniv Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Dev, Chengdu 610054, Peoples R China
Xu, Xiaorui
Wang, Zhuocheng
论文数: 0引用数: 0
h-index: 0
机构:
Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Dev, Chengdu 610054, Peoples R ChinaUniv Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Dev, Chengdu 610054, Peoples R China
Wang, Zhuocheng
Luo, Pan
论文数: 0引用数: 0
h-index: 0
机构:
Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Dev, Chengdu 610054, Peoples R ChinaUniv Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Dev, Chengdu 610054, Peoples R China
Luo, Pan
Zhang, Yuhao
论文数: 0引用数: 0
h-index: 0
机构:
Univ Elect Sci & Technol China, Glasgow Coll, Chengdu 611731, Peoples R ChinaUniv Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Dev, Chengdu 610054, Peoples R China
Zhang, Yuhao
Zhang, Bo
论文数: 0引用数: 0
h-index: 0
机构:
Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Dev, Chengdu 610054, Peoples R ChinaUniv Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Dev, Chengdu 610054, Peoples R China
机构:
Chinese Acad Sci, Inst Microelect, High Frequency High Voltage Device & Integrated C, Beijing 100029, Peoples R China
Univ Chinese Acad Sci UCAS, Beijing 100029, Peoples R ChinaChinese Acad Sci, Inst Microelect, High Frequency High Voltage Device & Integrated C, Beijing 100029, Peoples R China
Wang, Yuhao
Huang, Sen
论文数: 0引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Inst Microelect, High Frequency High Voltage Device & Integrated C, Beijing 100029, Peoples R China
Univ Chinese Acad Sci UCAS, Beijing 100029, Peoples R ChinaChinese Acad Sci, Inst Microelect, High Frequency High Voltage Device & Integrated C, Beijing 100029, Peoples R China
Huang, Sen
Jiang, Qimeng
论文数: 0引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Inst Microelect, High Frequency High Voltage Device & Integrated C, Beijing 100029, Peoples R China
Univ Chinese Acad Sci UCAS, Beijing 100029, Peoples R ChinaChinese Acad Sci, Inst Microelect, High Frequency High Voltage Device & Integrated C, Beijing 100029, Peoples R China
Jiang, Qimeng
Wang, Xinhua
论文数: 0引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Inst Microelect, High Frequency High Voltage Device & Integrated C, Beijing 100029, Peoples R China
Univ Chinese Acad Sci UCAS, Beijing 100029, Peoples R ChinaChinese Acad Sci, Inst Microelect, High Frequency High Voltage Device & Integrated C, Beijing 100029, Peoples R China
Wang, Xinhua
Guo, Fuqiang
论文数: 0引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Inst Microelect, High Frequency High Voltage Device & Integrated C, Beijing 100029, Peoples R China
Univ Chinese Acad Sci UCAS, Beijing 100029, Peoples R ChinaChinese Acad Sci, Inst Microelect, High Frequency High Voltage Device & Integrated C, Beijing 100029, Peoples R China
Guo, Fuqiang
Feng, Chao
论文数: 0引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Inst Microelect, High Frequency High Voltage Device & Integrated C, Beijing 100029, Peoples R China
Univ Chinese Acad Sci UCAS, Beijing 100029, Peoples R ChinaChinese Acad Sci, Inst Microelect, High Frequency High Voltage Device & Integrated C, Beijing 100029, Peoples R China
Feng, Chao
Fan, Jie
论文数: 0引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Inst Microelect, High Frequency High Voltage Device & Integrated C, Beijing 100029, Peoples R China
Univ Chinese Acad Sci UCAS, Beijing 100029, Peoples R ChinaChinese Acad Sci, Inst Microelect, High Frequency High Voltage Device & Integrated C, Beijing 100029, Peoples R China
Fan, Jie
Yin, Haibo
论文数: 0引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Inst Microelect, High Frequency High Voltage Device & Integrated C, Beijing 100029, Peoples R China
Univ Chinese Acad Sci UCAS, Beijing 100029, Peoples R ChinaChinese Acad Sci, Inst Microelect, High Frequency High Voltage Device & Integrated C, Beijing 100029, Peoples R China
Yin, Haibo
Gao, Xinguo
论文数: 0引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Inst Microelect, High Frequency High Voltage Device & Integrated C, Beijing 100029, Peoples R China
Univ Chinese Acad Sci UCAS, Beijing 100029, Peoples R ChinaChinese Acad Sci, Inst Microelect, High Frequency High Voltage Device & Integrated C, Beijing 100029, Peoples R China
Gao, Xinguo
Wei, Ke
论文数: 0引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Inst Microelect, High Frequency High Voltage Device & Integrated C, Beijing 100029, Peoples R China
Univ Chinese Acad Sci UCAS, Beijing 100029, Peoples R ChinaChinese Acad Sci, Inst Microelect, High Frequency High Voltage Device & Integrated C, Beijing 100029, Peoples R China
Wei, Ke
Zheng, Yingkui
论文数: 0引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Inst Microelect, High Frequency High Voltage Device & Integrated C, Beijing 100029, Peoples R China
Univ Chinese Acad Sci UCAS, Beijing 100029, Peoples R ChinaChinese Acad Sci, Inst Microelect, High Frequency High Voltage Device & Integrated C, Beijing 100029, Peoples R China
Zheng, Yingkui
Liu, Xinyu
论文数: 0引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Inst Microelect, High Frequency High Voltage Device & Integrated C, Beijing 100029, Peoples R China
Univ Chinese Acad Sci UCAS, Beijing 100029, Peoples R ChinaChinese Acad Sci, Inst Microelect, High Frequency High Voltage Device & Integrated C, Beijing 100029, Peoples R China