Effects of shallow trench isolation on low frequency noise characteristics of source-follower transistors in CMOS image sensors

被引:5
作者
Kwon, Sung-Kyu [1 ]
Kwon, Hyuk-Min [1 ]
Choi, Woon-Il [1 ]
Song, Hyeong-Sub [1 ]
Lee, Hi-Deok [1 ,2 ]
机构
[1] Chungnam Natl Univ, Dept Elect Engn, Taejon 305764, South Korea
[2] Korea Sensor Lab, Taejon 305764, South Korea
关键词
CMOS image sensor (CIS); Low frequency noise (LFN); Random telegraph signal (RTS) noise; Source-follower (SF); Shallow trench isolation (STI); TELEGRAPH SIGNAL-NOISE;
D O I
10.1016/j.sse.2016.02.005
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The effects of the shallow trench isolation (STI) edge on low frequency noise characteristics of sourcefollower (SF) transistors in CMOS image sensors (CIS) were investigated. Random telegraph signal (RTS) noise and 1/f noise were measured in a CIS operating voltage region for a realistic assessment. SF transistor with STI edge in contact with channel shows a lower probability of generating RTS noise but greater RTS amplitude due to the enhanced trap density induced by STI-induced damage. SF MOSFETs without STI exhibit a much lower 1/f noise power spectral density in spite of the greater RTS generation probability, which is due to the decreased trap density. Therefore, SF transistors without STI edge in contact with channel are promising candidates for low noise CIS applications. (C) 2016 Elsevier Ltd. All rights reserved.
引用
收藏
页码:29 / 32
页数:4
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