Growth of Ni-Co binary hydroxide on a reduced graphene oxide surface by a successive ionic layer adsorption and reaction (SILAR) method for high performance asymmetric supercapacitor electrodesle
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作者:
Jana, Milan
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CSIR, Cent Mech Engn Res Inst, Surface Engn & Tribol Div, Durgapur 713209, India
Acad Sci & Innovat Res AcSIR, CSIR CMERI Campus, Durgapur 713209, IndiaCSIR, Cent Mech Engn Res Inst, Surface Engn & Tribol Div, Durgapur 713209, India
Jana, Milan
[1
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Saha, Sanjit
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CSIR, Cent Mech Engn Res Inst, Surface Engn & Tribol Div, Durgapur 713209, India
Acad Sci & Innovat Res AcSIR, CSIR CMERI Campus, Durgapur 713209, IndiaCSIR, Cent Mech Engn Res Inst, Surface Engn & Tribol Div, Durgapur 713209, India
Saha, Sanjit
[1
,2
]
Samanta, Pranab
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CSIR, Cent Mech Engn Res Inst, Surface Engn & Tribol Div, Durgapur 713209, IndiaCSIR, Cent Mech Engn Res Inst, Surface Engn & Tribol Div, Durgapur 713209, India
Samanta, Pranab
[1
]
Murmu, Naresh Chandra
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CSIR, Cent Mech Engn Res Inst, Surface Engn & Tribol Div, Durgapur 713209, IndiaCSIR, Cent Mech Engn Res Inst, Surface Engn & Tribol Div, Durgapur 713209, India
Murmu, Naresh Chandra
[1
]
Kim, Nam Hoon
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Chonbuk Natl Univ, Dept BIN Convers Technol, Jeonju 561756, Jeonbuk, South KoreaCSIR, Cent Mech Engn Res Inst, Surface Engn & Tribol Div, Durgapur 713209, India
Kim, Nam Hoon
[3
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Kuila, Tapas
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CSIR, Cent Mech Engn Res Inst, Surface Engn & Tribol Div, Durgapur 713209, IndiaCSIR, Cent Mech Engn Res Inst, Surface Engn & Tribol Div, Durgapur 713209, India
Kuila, Tapas
[1
]
Lee, Joong Hee
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Chonbuk Natl Univ, Dept BIN Convers Technol, Jeonju 561756, Jeonbuk, South KoreaCSIR, Cent Mech Engn Res Inst, Surface Engn & Tribol Div, Durgapur 713209, India
Lee, Joong Hee
[3
]
机构:
[1] CSIR, Cent Mech Engn Res Inst, Surface Engn & Tribol Div, Durgapur 713209, India
[2] Acad Sci & Innovat Res AcSIR, CSIR CMERI Campus, Durgapur 713209, India
[3] Chonbuk Natl Univ, Dept BIN Convers Technol, Jeonju 561756, Jeonbuk, South Korea
A simple, additive-free, cost-effective and scalable successive ionic layer adsorption and reaction (SILAR) method is reported to prepare nickel-cobalt binary hydroxide (Ni-Co-BH) on a reduced graphene oxide (RGO) directing template over a macro-porous conductive nickel foam substrate. This green technique is not only considered as fundamental research interest, but also describes the commercial applications of supercapacitors to reduce the electrode fabrication cost. Three different Ni-Co-BH-G (Ni-Co-BH/ RGO) composites are synthesised by tailoring the nickel-cobalt ratios. The flower-like 3D framework of Ni-Co-BH-G provides a porous nano-structure to facilitate the charge transfer and ion diffusion. The cathodic peak current density vs. square root of the scan rate slope values of cyclic voltammetry are consistent with specific capacitance (SC) retention (vs. current density) from charge-discharge curves and the diffusion time constant of the Nyquist plot of the Ni-Co-BH-G composites. Taking the advantage of 3D conductive mesoporous open framework, the Ni-Co-BH-G has provided an excellent SC of 2130 F g(-1) at 2 A g(-1). An asymmetric supercapacitor device is designed with the optimized Ni-Co- BH-G as the positive electrode and concentrated HNO3 treated conducting carbon cloth (CCN) as the negative electrode. An excellent energy density of similar to 92 W h kg(-1) and a high power density of similar to 7.0 kW kg(-1) with lifetime stability up to 10 000 charge-discharge cycles (capacitance retention similar to 80%) are provided by the asymmetric device. Four asymmetric devices have been assembled in series, which provided similar to 5.6 V charge-discharge potential. The assembled system has powered a 5 V light-emitting diode (LED) successfully.
机构:
CSIR Cent Electrochem Res Inst, Electroplating & Met Finishing Technol Div, Karaikkudi 630003, Tamil Nadu, IndiaCSIR Cent Electrochem Res Inst, Electroplating & Met Finishing Technol Div, Karaikkudi 630003, Tamil Nadu, India
Kumaraguru, S.
Yesuraj, J.
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Univ Madras, Dept Energy, Guindy Campus, Chennai 600025, Tamil Nadu, IndiaCSIR Cent Electrochem Res Inst, Electroplating & Met Finishing Technol Div, Karaikkudi 630003, Tamil Nadu, India
Yesuraj, J.
Mohan, S.
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CSIR Cent Electrochem Res Inst, Electroplating & Met Finishing Technol Div, Karaikkudi 630003, Tamil Nadu, IndiaCSIR Cent Electrochem Res Inst, Electroplating & Met Finishing Technol Div, Karaikkudi 630003, Tamil Nadu, India