Reflectance of Silicon Photomultipliers at Vacuum Ultraviolet Wavelengths

被引：8

作者：

Lv, P. ^{[1
]}

Cao, G. F. ^{[1
,2
]}

Wen, L. J. ^{[1
]}

Kharusi, S. Al ^{[3
]}

Anton, G. ^{[4
]}

Arnquist, I. J. ^{[5
]}

Badhrees, I. ^{[6
,7
]}

Barbeau, P. S. ^{[8
,9
]}

Beck, D. ^{[10
]}

Belov, V. ^{[11
]}

Bhatta, T. ^{[12
]}

Breur, P. A. ^{[13
]}

Brodsky, J. P. ^{[14
]}

Brown, E. ^{[15
]}

Brunner, T. ^{[3
,16
]}

Mamahit, S. Byrne ^{[16
]}

Caden, E. ^{[17
,18
]}

Cao, L. ^{[19
]}

Chambers, C. ^{[3
]}

Chana, B. ^{[6
]}

Charlebois, S. A. ^{[20
]}

Chiu, M. ^{[21
]}

Cleveland, B. ^{[17
,18
]}

Coon, M. ^{[10
]}

Craycraft, A. ^{[22
]}

Dalmasson, J. ^{[23
]}

Daniels, T. ^{[24
]}

Darroch, L. ^{[3
]}

St. Croix, A. De ^{[16
,25
]}

Mesrobian-Kabakian, A. Der ^{[17
]}

Deslandes, K. ^{[20
]}

DeVoe, R. ^{[23
]}

Vacri, M. L. Di ^{[5
]}

Dilling, J. ^{[16
,25
]}

Ding, Y. Y. ^{[1
]}

Dolinski, M. J. ^{[26
]}

Doria, L. ^{[16
,27
]}

Dragone, A. ^{[13
]}

Echevers, J. ^{[10
]}

Edaltafar, F. ^{[16
]}

Elbeltagi, M. ^{[6
]}

Fabris, L. ^{[28
]}

Fairbank, D. ^{[22
]}

Fairbank, W. ^{[22
]}

Farine, J. ^{[17
]}

Ferrara, S. ^{[5
]}

Feyzbakhsh, S. ^{[29
,30
]}

Fucarino, A. ^{[15
]}

Gallina, G. ^{[16
,25
]}

Gautam, P. ^{[26
]}

机构：

[1] Chinese Acad Sci, Inst High Energy Phys, Beijing 100049, Peoples R China

[2] Univ Chinese Acad Sci, Dept Phys, Beijing 100864, Peoples R China

[3] McGill Univ, Phys Dept, Montreal, PQ H3A 2T8, Canada

[4] Friedrich Alexander Univ Erlangen Nurnberg, Erlangen Ctr Astroparticle Phys ECAP, D-91058 Erlangen, Germany

[5] Pacific Northwest Natl Lab, Richland, WA 99352 USA

[6] Carleton Univ, Dept Phys, Ottawa, ON K1S 5B6, Canada

[7] King Abdulaziz City Sci & Technol, Riyadh 12354, Saudi Arabia

[8] Duke Univ, Dept Phys, Durham, NC 27708 USA

[9] Triangle Univ Nucl Lab TUNL, Durham, NC 27708 USA

[10] Univ Illinois, Dept Phys, Urbana, IL 61801 USA

[11] Kurchatov Inst, AI Alikhanov Natl Res Ctr, Inst Theoret & Expt Phys, Moscow 117218, Russia

[12] Univ South Dakota, Dept Phys, Vermillion, SD 57069 USA

[13] SLAC Natl Accelerator Lab, Menlo Pk, CA 94025 USA

[14] Lawrence Livermore Natl Lab, Livermore, CA 94550 USA

[15] Rensselaer Polytech Inst, Dept Phys Appl Phys & Astron, Troy, NY 12180 USA

[16] TRIUMF, Vancouver, BC V6T 2A3, Canada

[17] Laurentian Univ, Dept Phys, Sudbury, ON P3E 2C6, Canada

[18] SNOLAB, Sudbury, ON P3Y 1N2, Canada

[19] Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China

[20] Univ Sherbrooke, Dept Genie Elect & Genie Informat, Sherbrooke, PQ J1K 2R1, Canada

[21] Brookhaven Natl Lab, Upton, NY 11973 USA

[22] Colorado State Univ, Dept Phys, Ft Collins, CO 80523 USA

[23] Stanford Univ, Dept Phys, Stanford, CA 94305 USA

[24] Univ N Carolina, Dept Phys & Phys Oceanog, Wilmington, NC 28403 USA

[25] Univ British Columbia, Dept Phys & Astron, Vancouver, BC V6T 1Z1, Canada

[26] Drexel Univ, Dept Phys, Philadelphia, PA 19104 USA

[27] Johannes Gutenberg Univ Mainz, Inst Kernphys, D-55122 Mainz, Germany

[28] Oak Ridge Natl Lab, Oak Ridge, TN 37831 USA

[29] Univ Massachusetts, Amherst Ctr Fundamental Interact, Amherst, MA 01003 USA

[30] Univ Massachusetts, Dept Phys, Amherst, MA 01003 USA

[31] Univ Alabama, Dept Phys & Astron, Tuscaloosa, AL 35487 USA

[32] Yale Univ, Dept Phys, Wright Lab, New Haven, CT 06511 USA

[33] Colorado Sch Mines, Dept Phys, Golden, CO 80401 USA

[34] IBS Ctr Underground Phys, Daejeon 34126, South Korea

[35] SUNY Stony Brook, Dept Phys & Astron, Stony Brook, NY 11794 USA

[36] Indiana Univ, Dept Phys, Bloomington, IN 47405 USA

[37] Indiana Univ, CEEM, Bloomington, IN 47405 USA

[38] Univ Bern, Albert Einstein Ctr, LHEP, CH-3012 Bern, Switzerland

[39] Univ Calif San Diego, Dept Phys, La Jolla, CA 92093 USA

来源：

IEEE TRANSACTIONS ON NUCLEAR SCIENCE | 2020年 / 67卷 / 12期

基金：

加拿大创新基金会; 加拿大自然科学与工程研究理事会; 俄罗斯基础研究基金会;

关键词：

Photonics; Laser beams; Silicon; Photodetectors; Surface treatment; Optical variables measurement; Measurement by laser beam; Diffuse reflectance; photon detection efficiency (PDE); silicon photomultiplier (SiPM); specular reflectance; vacuum ultraviolet (VUV); LIQUID XENON;

D O I：

10.1109/TNS.2020.3035172

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Characterization of the vacuum ultraviolet (VUV) reflectance of silicon photomultipliers (SiPMs) is important for large-scale SiPM-based photodetector systems. We report the angular dependence of the specular reflectance in vacuum of SiPMs manufactured by Fondazionc Bruno Kessler (FBK) and Hamamatsu Photonics K.K. (HPK) over wavelengths ranging from 120 to 280 nm. Refractive index and extinction coefficient of the thin silicon-dioxide film deposited on the surface of the FBK SiPMs are derived from reflectance data of an FBK silicon wafer with the same deposited oxide film as SiPMs. The diffuse reflectance of SiPMs is also measured at 193 nm. We use the VUV spectral dependence of the optical constants to predict the reflectance of the FBK silicon wafer and FBK SiPMs in liquid xenon.

引用

页码：2501 / 2510

页数：10

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