TSV Redundancy: Architecture and Design Issues in 3D IC

被引:0
|
作者
Hsieh, Ang-Chih [1 ]
Hwang, TingTing [1 ]
Chang, Ming-Tung [2 ]
Tsai, Min-Hsiu [2 ]
Tseng, Chih-Mou [2 ]
Li, Hung-Chun [2 ]
机构
[1] Natl Tsing Hua Univ, Dept Comp Sci, Hsinchu 300, Taiwan
[2] Global Unichip Corp, Hsinchu 300, Taiwan
来源
2010 DESIGN, AUTOMATION & TEST IN EUROPE (DATE 2010) | 2010年
关键词
D O I
暂无
中图分类号
TP [自动化技术、计算机技术];
学科分类号
0812 ;
摘要
3D technology provides many benefits including high density, high band-with, low-power, and small form-factor. Through Silicon Via (TSV), which provides communication links for dies in vertical direction, is a critical design issue in 3D integration. Just like other components, the fabrication and bonding of TSVs can fail. A failed TSV may cause a number of known-good-dies that are stacked together to be discarded. This can severely increase the cost and decrease the yield as the number of dies to be stacked increases. A redundant TSV architecture with reasonable cost for ASICs is proposed in this paper. Design issues including recovery rate and timing problem are addressed. Based on probabilistic models, some interesting findings are reported. First, the probability that three or more TSVs are failed in a tier is less than 0.002%. Assumption of that there are at most two failed TSVs in a tier is sufficient to cover 99.998% of all possible faulty free and faulty cases. Next, with one redundant TSV allocated to one TSV block, limiting the number of TSVs in each TSV block to be no greater than 50 and 25 leads to 90% and 95% recovery rates when 2 failed TSVs are assumed. Finally, analysis on overall yield shows that the proposed design can successfully recover most of the failed chips and increase the yield of TSV bonding to 99.99%. This can effectively reduce the cost of manufacturing 3D ICs.
引用
收藏
页码:166 / 171
页数:6
相关论文
共 50 条
  • [1] TSV Redundancy: Architecture and Design Issues in 3-D IC
    Hsieh, Ang-Chih
    Hwang, TingTing
    IEEE TRANSACTIONS ON VERY LARGE SCALE INTEGRATION (VLSI) SYSTEMS, 2012, 20 (04) : 711 - 722
  • [2] A TSV Alignment Design for Multilayer 3D IC
    Zhao, Wei
    Hou, Ligang
    Peng, Xiaohong
    Wang, Jinhui
    Fu, Jingyan
    Yang, Yang
    PROCEEDINGS OF 2015 IEEE 11TH INTERNATIONAL CONFERENCE ON ASIC (ASICON), 2015,
  • [3] 3D IC with TSV: Status and developments
    Vardaman, E. Jan
    SOLID STATE TECHNOLOGY, 2013, 56 (02) : 12 - 12
  • [4] Homogeneous Integration for 3D IC with TSV
    Kwai, Ding-Ming
    2010 15TH ASIA AND SOUTH PACIFIC DESIGN AUTOMATION CONFERENCE (ASP-DAC 2010), 2010, : 538 - 539
  • [5] Channel Design for Wide System Bandwidth in a TSV based 3D IC
    Kim, Heegon
    Cho, Jonghyun
    Kim, Joohee
    Kim, Myunghoi
    Lee, Junho
    Lee, Hyungdong
    Park, Kunwoo
    Kim, Joungho
    Pak, Jun So
    2011 15TH IEEE WORKSHOP ON SIGNAL PROPAGATION ON INTERCONNECTS (SPI), 2011, : 57 - 60
  • [6] Research on TSV Positioning in 3D IC Placement
    Hou, Ligang
    Bai, Shu
    Wang, Jinhui
    2011 IEEE ELECTRICAL DESIGN OF ADVANCED PACKAGING AND SYSTEMS SYMPOSIUM (EDAPS), 2011,
  • [7] Distributed Multi TSV 3D Clock Distribution Network in TSV-based 3D IC
    Kim, Dayoung
    Kim, Joohee
    Cho, Jonghyun
    Pak, Jun So
    Kim, Joungho
    Lee, Hyungdong
    Lee, Junho
    Park, Kunwoo
    2011 IEEE 20TH CONFERENCE ON ELECTRICAL PERFORMANCE OF ELECTRONIC PACKAGING AND SYSTEMS (EPEPS), 2011, : 87 - 90
  • [8] TSV Interposer Fabrication for 3D IC Packaging
    Rao, Vempati Srinivasa
    Wee, Ho Soon
    Vincent, Lee Wen Sheng
    Yu, Li Hong
    Ebin, Liao
    Nagarajan, Ranganathan
    Chong, Chai Tai
    Zhang, Xiaowu
    Damaruganath, Pinjala
    2009 11TH ELECTRONICS PACKAGING TECHNOLOGY CONFERENCE (EPTC 2009), 2009, : 431 - 437
  • [9] TSV modelling in 3D IC thermoelectric simulation
    Ye, Tongyang
    Hou, Ligang
    Zhang, Shier
    Wang, Jinhui
    Peng, Xiaohong
    2017 IEEE 12TH INTERNATIONAL CONFERENCE ON ASIC (ASICON), 2017, : 678 - 681
  • [10] Design Issues and Considerations for Low-Cost 3-D TSV IC Technology
    Van der Plas, Geert
    Limaye, Paresh
    Loi, Igor
    Mercha, Abdelkarim
    Oprins, Herman
    Torregiani, Cristina
    Thijs, Steven
    Linten, Dimitri
    Stucchi, Michele
    Katti, Guruprasad
    Velenis, Dimitrios
    Cherman, Vladimir
    Vandevelde, Bart
    Simons, Veerle
    De Wolf, Ingrid
    Labie, Riet
    Perry, Dan
    Bronckers, Stephane
    Minas, Nikolaos
    Cupac, Miro
    Ruythooren, Wouter
    Van Olmen, Jan
    Phommahaxay, Alain
    de ten Broeck, Muriel de Potter
    Opdebeeck, Ann
    Rakowski, Michal
    De Wachter, Bart
    Dehan, Morin
    Nelis, Marc
    Agarwal, Rahul
    Pullini, Antonio
    Angiolini, Federico
    Benini, Luca
    Dehaene, Wim
    Travaly, Youssef
    Beyne, Eric
    Marchal, Paul
    IEEE JOURNAL OF SOLID-STATE CIRCUITS, 2011, 46 (01) : 293 - 307