Effects of catalyst-generated atomic hydrogen treatment on amorphous silicon fabricated by Liquid-Si printing

被引：5

作者：

Murayama, Hiroko ^{[1
]}

Ohyama, Tatsushi ^{[1
]}

Terakawa, Akira ^{[1
]}

Takagishi, Hideyuki ^{[2
,3
]}

Masuda, Takashi ^{[2
,4
]}

Ohdaira, Keisuke ^{[2
,3
]}

Shimoda, Tatsuya ^{[2
,3
,4
]}

机构：

[1] Panasonic Corp, Device Solut Ctr, R&D Div, Moriguchi, Osaka 5708501, Japan

[2] Japan Adv Inst Sci & Technol, Nomi, Ishikawa 9231292, Japan

[3] Japan Sci & Technol Agcy, ALCA, Nomi, Ishikawa 9231292, Japan

[4] Japan Sci & Technol Agcy, ERATO, Nomi, Ishikawa 9231292, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2014年 / 53卷 / 05期

基金：

日本科学技术振兴机构;

关键词：

SOLAR-CELLS; FILMS; TEMPERATURE; CYCLOPENTASILANE; SILANE; PLASMA;

D O I：

10.7567/JJAP.53.05FM06

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The film property distributions along the thickness direction of the catalyst-generated atomic hydrogen (Cat-H*) treatment effects on hydrogenated amorphous silicon (a-Si: H) fabricated by plasma-enhanced chemical vapor deposition (plasma-CVD) and Liquid-Si printing (LSP) were systematically investigated. The a-Si: H films fabricated by LSP (L-a-Si: H) had nanosize voids; however, these films showed a decrease in void size around the surface region after Cat-H* treatment, in contrast to stable plasma-CVD films without voids. The decrease in nonaffected area by Cat-H* treatment in L-a-Si: H films improved the performance of a-Si: H solar cells with L-a-Si: H. Additionally, we achieved a 3.1% conversion efficiency for a-Si: H solar cells with L-a-Si: H as the active layer by stacking nondoped a-Si: H, fabricated by plasma-CVD, on the active layer. (C) 2014 The Japan Society of Applied Physics

引用

页数：4

共 3 条

[1] Photo-stability of a-Si solar cells fabricated by "Liquid-Si printing method" and treated with catalytic generated atomic hydrogen
Murayama, Hiroko
Ohyama, Tatsushi
Yoshida, Isao
Terakawa, Akira
Masuda, Takashi
Ohdaira, Keisuke
Shimoda, Tatsuya
THIN SOLID FILMS, 2015, 575 : 100 - 102
[2] Effects of Annealing and Atomic Hydrogen Treatment on Aluminum Oxide Passivation Layers for Crystalline Silicon Solar Cells
Irikawa, Junpei
Miyajima, Shinsuke
Kida, Shuhei
Watahiki, Tatsuro
Konagai, Makoto
JAPANESE JOURNAL OF APPLIED PHYSICS, 2011, 50 (01)
[3] Effects of hydrogen partial pressure on boron-doped hydrogenated amorphous silicon (a-Si:H(B)) properties
Khelifati, N.
Cherfi, R.
Keffous, A.
Rahal, A.
Kechouane, M.
THIN FILMS AND POROUS MATERIALS, 2009, 609 : 81 - +

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