Dynamics of phasons; Phase defects formed on dimer rows, and related structural changes of the Si(100) surface at 80 K studied by scanning tunneling microscopy

被引:14
作者
Shigekawa, H [1 ]
Miyake, K [1 ]
Ishida, M [1 ]
Hata, K [1 ]
机构
[1] UNIV TSUKUBA, TSUKUBA ADV RES ALLIANCE, CTR TARA, TSUKUBA, IBARAKI 305, JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1997年 / 36卷 / 3A期
关键词
STM; phase transition; surface defects; Si(100); phase defect; dimer row;
D O I
10.1143/JJAP.36.L294
中图分类号
O59 [应用物理学];
学科分类号
摘要
Type-P defects, which are mobile phase defects on dimer rows with a structure similar to that of the type-C defect, were observed on Si(100) surface at 80 K, however, the observed surface structure was mainly c(4 x 2); contrary to the previous results obtained at 6 K. Complete p(2 x 2) arrangement was unstable, and type-P defects tended to form pairs with other type-P defects on neighboring dimer rows; resulting in a reduction of the area with complete p(2 x 2) arrangement. This is the first observation of the interacting phasons; type-P defects formed on Si(100) surface. The observed results were analyzed with the Ising model, and domain boundaries between c(4 x 2) and p(2 x 2) arrangements were found to play an important role in the dynamics of type-P defects at 80 K.
引用
收藏
页码:L294 / L297
页数:4
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