Linear thermal expansion measurements of single crystal silicon for validation of interferometer based cryogenic dilatometer

被引:0
作者
Karlmann, P. B. [1 ]
Klein, K. J. [1 ]
Halverson, P. G. [1 ]
Peters, R. D. [1 ]
Levine, M. B. [1 ]
Van Buren, D. [1 ]
Dudik, M. J. [1 ]
机构
[1] CALTECH, Jet Prop Lab, NASA, 4800 Oak Grove Dr, Pasadena, CA 91109 USA
来源
ADVANCES IN CRYOGENIC ENGINEERING, VOL 52A & 52B | 2006年 / 824卷
关键词
single crystal silicon; thermal expansion; thermal strain; dilatometer;
D O I
暂无
中图分类号
O414.1 [热力学];
学科分类号
摘要
Linear thermal expansion measurements were performed for high-purity P-type single crystal silicon over a temperature range of 30K to 310K to validate the accuracy of JPL's interferometer-based Cryogenic Dilatometer Facility. This system was developed to better characterize thermophysical properties of precision engineering materials at cryogenic temperatures for space-based optical systems. An accurate measurement of these properties is critical for the success of missions such as the James Webb Space Telescope and the Terrestrial Planet Finder Coronagraph where picometer-level instabilities and thermal deformations impact performance. Results from these single crystal silicon measurements show a mean system repeatability of 4 ppb/K in the coefficient of thermal expansion (CTE) from 35K to 305K. Comparison with NIST/CODATA recommended values shows agreement of better than 2 ppb/K from 30K to 80K, better than 11 ppb/K from 80K to 165K, and better than 2 ppb/K from 165K to 305K.
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页码:35 / +
页数:2
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  • [1] Development of a precision cryogenic dilatometer for James Webb Space Telescope Materials testing
    Dudik, MJ
    Halverson, PG
    Levine, M
    Marcin, MT
    Peters, RD
    Shaklan, S
    [J]. OPTICAL MATERIALS AND STRUCTURES TECHNOLOGIES, 2003, 5179 : 155 - 164
  • [2] Continued development of a precision cryogenic dilatometer for the James Webb Space Telescope
    Karlmann, PB
    Dudik, MJ
    Halverson, PG
    Levine, M
    Marcin, M
    Peters, RD
    Shaklan, S
    Van Buren, D
    [J]. SPACE SYSTEMS ENGINEERING AND OPTICAL ALIGNMENT MECHANISMS, 2004, 5528 : 63 - 71
  • [3] LINEAR THERMAL-EXPANSION MEASUREMENTS ON SILICON FROM 6 TO 340 K
    LYON, KG
    SALINGER, GL
    SWENSON, CA
    WHITE, GK
    [J]. JOURNAL OF APPLIED PHYSICS, 1977, 48 (03) : 865 - 868
  • [4] RECOMMENDED VALUES FOR THE THERMAL EXPANSIVITY OF SILICON FROM 0-K TO 1000-K
    SWENSON, CA
    [J]. JOURNAL OF PHYSICAL AND CHEMICAL REFERENCE DATA, 1983, 12 (02) : 179 - 182
  • [5] Development of a low-temperature laser interferometric dilatometer using a cryogenic refrigerator
    Yamada, N
    Okaji, M
    [J]. HIGH TEMPERATURES-HIGH PRESSURES, 2000, 32 (02) : 199 - 205