Atmospheric pressure glow discharge CVD of Al2O3 thin films

被引：20

作者：

Hodgkinson, John L. ^{[1
]}

Sheel, David W. ^{[1
]}

Yates, Heather M. ^{[1
]}

Pemble, Martyn E. ^{[1
]}

机构：

[1] Univ Salford, Inst Mat Res, Salford M5 4WT, Lancs, England

来源：

PLASMA PROCESSES AND POLYMERS | 2006年 / 3卷 / 08期

关键词：

alumina; atmospheric pressure glow discharge; films; plasma-enhanced chemical vapor deposition (PE-CVD);

D O I：

10.1002/ppap.200600042

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We report for the first time deposition of aluminium oxide thin films by APGD plasma enhanced CVD. This approach allows deposition at substantially lower substrate temperatures than normally used in atmospheric pressure based processing. The films are analysed by SEM, XPS, RBS, XRD and optical properties. It is demonstrated that the APCD approach yields films which are essentially smooth, conformal and free from pinholes or other imperfections.

引用

页码：597 / 605

页数：9