Bi2:Bi2Te3 stacking influence on the surface electronic response of the topological insulator Bi4Te3

被引:8
作者
Chagas, Thais [1 ,3 ]
Ribeiro, Guilherme A. S. [1 ]
Goncalves, Pedro H. R. [1 ]
Calil, Luan [1 ]
Silva, Wendell S. [2 ]
Malachias, Angelo [1 ]
Mazzoni, Mario S. C. [1 ]
Magalhaes-Paniago, Rogerio [1 ]
机构
[1] Univ Fed Minas Gerais, Dept Fis, Av Pres Antonio Carlos 6627, BR-31270901 Belo Horizonte, MG, Brazil
[2] Ctr Res Energy & Mat, Brazilian Synchrotron Light Lab, R Giuseppe Maximo Scolfaro 10000, BR-13083970 Campinas, SP, Brazil
[3] Univ Siegen, Dept Phys, Walter Flex Str 3, D-57072 Siegen, Germany
来源
ELECTRONIC STRUCTURE | 2020年 / 2卷 / 01期
关键词
topological insulator; DFT; STM/STS; structural and electronic properties; BI2SE3;
D O I
10.1088/2516-1075/ab7398
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We report on the successful synthesis of a crystal of the strong topological insulator Bi4Te3 and the study of its surface electronic response. A combination of theoretical and experimental techniques allowed for a systematic study of the composition and electronic properties of the sample. These techniques include density functional theory (DFT), scanning tunneling microscopy and spectroscopy (STM-STS). DFT predicts that distinct surface topological states exist for the two surface terminations of Bi4Te3, i.e. Bi-2 and Bi2Te3. These terminations are also clearly distinguished in STS measurements, which allow choosing the main conducting channel through a combination of topography and electronic response. We find that the density of states are similar to those of their parent crystals Bi-2 and Bi2Te3, albeit shifted in energy.
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页数:9
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