Improved semipolar green InGaN/GaN quantum wells on asymmetrically grown (11(2)over-bar2) GaN templates and their correlations

被引:7
作者
Wu, Zhengyuan [1 ,2 ,3 ]
Shih, Tienmo [3 ]
Li, Jinchai [3 ]
Tian, Pengfei [1 ,2 ]
Liu, Ran [1 ,2 ]
Kang, Junyong [3 ]
Fang, Zhilai [1 ,2 ]
机构
[1] Fudan Univ, Minist Educ, Engn Res Ctr Adv Lighting Technol, Shanghai 200433, Peoples R China
[2] Fudan Univ, Acad Engn & Technol, Shanghai 200433, Peoples R China
[3] Xiamen Univ, Dept Phys, Collaborat Innovat Ctr Optoelect Semicond & Effic, Xiamen 361005, Peoples R China
基金
中国国家自然科学基金;
关键词
NITRIDE; SEMICONDUCTORS; DEFECTS; FILMS;
D O I
10.1039/c8ce00151k
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Asymmetric island sidewall growth (AISG) is employed to reduce the threading defect density and to modify the surface/interface properties of semipolar GaN templates and InGaN/GaN quantum wells (QWs). We have found that the microstructures and optical properties of the semipolar InGaN/GaN QWs are well correlated with the threading defect density and surface properties of semipolar growth templates. Without AISG, surface undulation, indium fluctuation, and a relatively high indium content within InGaN layers on conventional GaN templates are observed and correlated with high-density threading defects and the formation of specific microfacets with more N dangling bonds on the surface. With AISG, these semipolar InGaN/GaN QWs on modified GaN templates exhibit a uniform indium distribution in the absence of threading defects. The optical properties of InGaN/GaN QWs are significantly improved, and this improvement is attributed to the surface modification of GaN templates, the reduction in threading defect density, and the higher uniformity of indium distribution within InGaN layers.
引用
收藏
页码:2053 / 2059
页数:7
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