Electrical characterization of Ge-Sb-Te phase change nano-pillars using conductive atomic force microscopy

被引:13
作者
Bae, Byeong-Ju [1 ]
Hong, Sung-Hoon [1 ]
Hwang, Seon-Yong [1 ]
Hwang, Jae-Yeon [1 ]
Yang, Ki-Yeon [1 ]
Lee, Heon [1 ]
机构
[1] Korea Univ, Dept Mat Sci & Engn, Seoul, South Korea
关键词
NONVOLATILE; IMPRINT;
D O I
10.1088/0268-1242/24/7/075016
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The electrical characteristic of phase change material was studied in nano-scale using nanoimprint lithography and a conducting atomic force microscopy measurement system. Nanoimprint lithography was used to fabricate the nano-scale phase change material pattern. A Pt-coated AFM tip was used as a top electrode to measure the electrical characteristics of the GST nano-pillar. The GST nano-pillar, which is 200 nm in diameter, was amorphized by 2 V and 5 ns reset pulse and was then brought back to the crystalline phase by applying 1.3 V and 150 ns set pulse. Using this measurement system, the GST nano-pillar was switched between the amorphous and crystalline phases more than five times. The results of the reset and the set current measurement with the GST nano-pillar sizes show that the reset and the set currents also decreased with the decrease of the GST pillar size.
引用
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页数:5
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