Ferroelectric and piezoelectric properties of Na0.52K0.48NbO3 thin films prepared by radio frequency magnetron sputtering

被引:66
作者
Lee, Hai Joon [1 ]
Kim, Ill Won [1 ]
Kim, Jin Soo [4 ]
Ahn, Chang Won [3 ]
Park, Bae Ho [2 ]
机构
[1] Univ Ulsan, Dept Phys, Ulsan 680749, South Korea
[2] Konkuk Univ, Dept Phys, Seoul 143701, South Korea
[3] Korea Basic Sci Inst, High Technol Components & Mat Res Ctr, Pusan 618230, South Korea
[4] Pukyong Natl Univ, Dept Phys, Pusan 680749, South Korea
关键词
atomic force microscopy; dielectric polarisation; ferroelectric coercive field; ferroelectric thin films; leakage currents; permittivity; piezoelectric thin films; potassium compounds; sodium compounds; sputtered coatings; X-ray diffraction; PULSED-LASER DEPOSITION; DIELECTRIC-RELAXATION; NA0.5K0.5NBO3; FILMS; DEVICE APPLICATIONS; BISMUTH-TITANATE; CAPACITORS; CERAMICS; GROWTH;
D O I
10.1063/1.3095500
中图分类号
O59 [应用物理学];
学科分类号
摘要
Ferroelectric Na0.52K0.48NbO3 (NKN) thin film on Pt/Ti/SiO2/Si substrate was prepared using the radio frequency magnetron sputtering method. The single phase and grain morphologies of NKN were confirmed by x-ray diffraction and atomic force microscopy analysis, respectively. The remnant polarization P-r and coercive electric field E-c of NKN film were 22.5 mu C/cm(2) and 90 kV/cm, respectively. The NKN film displayed low frequency dielectric dispersion in the temperature range 25-500 degrees C. The leakage current density of the film was 3.0x10(-7) A/cm(2) at 100 kV/cm. The piezoelectric constant d(33) was estimated to be 45 pm/V using the piezoelectric force microscopy.
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页数:3
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