Low-propagation-loss Ta2O5 optical waveguides on silica substrate

被引：5

作者：

Li, Gen ^{[1
]}

Maruyama, Takeo ^{[1
]}

Iiyama, Koichi ^{[1
]}

机构：

[1] Kanazawa Univ, Grad Sch Nat Sci & Technol, Kanazawa, Ishikawa 9201192, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2014年 / 53卷 / 04期

关键词：

ON-CHIP; THIN-FILMS; LASERS; NETWORKS; SI; PHOTODETECTORS; INTERCONNECTS;

D O I：

10.7567/JJAP.53.04EG12

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

In this paper, a high-refractive-index (similar to 2.0) and low-propagation-loss tantalum pentoxide (Ta2O5) waveguide is reported. We fabricated Ta2O5 strip optical waveguides with a cross section of 400 nm x 10 mu m by chemical solution deposition (CSD) followed by CF4 reactive ion etching. The optimum fabrication steps make it possible to obtain the Ta2O5 strip optical waveguides with a propagation loss of less than 1 dB/cm at 830 nm, which is significant for optoelectronic integrated circuits in the 0.8 mu m wavelength range. (C) 2014 The Japan Society of Applied Physics

引用

页数：4

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