The influence of increasing doses of silicon on maize seedlings grown under salt stress

The aim of this study was to evaluate the effect of increasing silicon (Si) doses (0, 1.0, 1.7, 3.0 mM) on two maize varieties (Kosmo 230 and SMH 220) grown under optimal and salt stress (60mM sodium chloride (NaCl)) conditions. After 7days of the cultivation, both growth and physiological parameters were determined. Application of Si improved some growth parameters, chlorophyll concentration and reduced malondialdehyde content. Kosmo 230 variety very well tolerated all concentrations of silicate and the highest dose significantly increased fresh and dry matter of plants grown under both optimal and stress conditions, meanwhile in SMH 220 some growth parameters were depressed. Si application enhanced chlorophyll content under stress conditions but did not alter fluorescence parameters. Reaction of Kosmo 230 variety to all three concentrations of silicate was more positive than SMH 220. Application of silicate may alleviate the negative effects of stress but needs a careful supply, especially at higher doses.