Patterning of two-dimensional nanoscale features using grating-based multiple beams interference lithography

被引：29

作者：

Chua, J. K. ^{[1
]}

Murukeshan, V. M. ^{[1
]}

机构：

[1] Nanyang Technol Univ, Sch Mech & Aerosp Engn, Singapore 639798, Singapore

来源：

PHYSICA SCRIPTA | 2009年 / 80卷 / 01期

关键词：

D O I：

10.1088/0031-8949/80/01/015401

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

A grating-based multiple beams interference lithography for printing of periodic two-dimensional features is proposed in this paper both theoretically and experimentally. The analytical expressions of the interference intensity distributions are derived with the photoresist layer modeled as a sandwiched layer. The influence of polarization of incident beams on the profiles of resist features are also investigated and discussed via both experimental and theoretical approaches. Good agreement between theoretical and experimental results is observed.

引用

页数：5

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