Processing and recombination lifetime characterization of silicon microstrip detectors

被引:21
作者
Härkönen, J [1 ]
Tuominen, E
Lassila-Perini, K
Palokangas, M
Yli-Koski, M
Ovchinnikov, V
Heikkilä, P
Palmu, L
Kallijärvi, S
机构
[1] Helsinki Inst Phys, CERN, Div EP, CH-1211 Geneva 23, Switzerland
[2] Helsinki Univ Technol, Electron Phys Lab, FIN-02150 Espoo, Finland
[3] Helsinki Univ Technol, Ctr Microelect, FIN-02150 Espoo, Finland
[4] Univ Oulu, Microelect Instrumentat Lab, Kemi, Finland
关键词
strip detector; lifetime; Photoconductivity Decay;
D O I
10.1016/S0168-9002(02)00548-X
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Three sets of silicon microstrip detectors have been processed and characterized. Recombination lifetimes of each set have been measured by Microwave Photoconductivity Decay (muPCD) method. In the this method, the silicon is illuminated by a laser pulse that generates electron hole pairs. The transient of the decaying carrier concentration is monitored by using a microwave signal. The recombination lifetime is a measure of the material quality i.e., defect/impurity concentration which affects the detectors' electrical properties. A correlation between the recombination lifetime and the leakage current has been observed and discussed. The leakage current density in the best devices was about 6 nA cm(-2) at 40 V. The average lifetime in the monitor wafer of this set was about 6500 mus. In comparison, average lifetime less than 1000 mus resulted in leakage currents of more than 100 nA cm(-2). (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:159 / 165
页数:7
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