Crystallographic structure of gold films electrodeposited at low current densities

被引:21
作者
Bozzini, B
Giovannelli, G
Natali, S
Fanigliulo, A
Cavallotti, PL
机构
[1] Univ Lecce, INFM, Dipartimento Ingn Innovaz, I-73100 Lecce, Italy
[2] Univ Roma 1, Dipartimento ICMMPM, I-00184 Rome, Italy
[3] Politecn Milan, Dipartimento Chim Fis Appl, I-20131 Milan, Italy
关键词
D O I
10.1023/A:1019655522750
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this paper we report on the electrodeposition of Au from dicyanoaurate electrolytes at low current densities. If electrodeposition is carried out at current densities lower than 0.25 mA cm(-2) a new hexagonal crystalline structure can be observed. This structure is generally codeposited with fcc Au. The new structure dominates for short deposition times. This structure is stabilised by the addition to the bath of metal ions giving rise to UPD behaviour on Au, such as Cu2+ and Tl+. This structure was tentatively assigned to the space group 184 (p6cc). This structure can be explained in terms of the incorporation of extraneous, probably cyanide-related, material. This interpretation is also supported by in situ Raman spectroscopy and by XPS analyses showing that the bulk deposits contain C, N and K. The electrochemical behaviour of the electrodeposition system was studied by cyclic voltammetry. Cyanoaurate baths display a significant cathodic passivation. This phenomenon is reduced by the addition of Cu2+ or Tl+. Voltammograms of baths containing these additives show clear UPD features but no stripping peaks. This behaviour is suggestive of an assisted Au electrodeposition mechanism. Tl is deposited at UPD and oxidatively desorbed by Au(I). Cu is codeposited at UPD with Au forming an alloy. (C) 2002 Kluwer Academic Publishers.
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页码:3903 / 3913
页数:11
相关论文
共 31 条
  • [1] STUDY OF UNDERPOTENTIAL DEPOSITION ON METAL SINGLE-CRYSTALS BY SURFACE TECHNIQUES
    ABERDAM, D
    DURAND, R
    FAURE, R
    [J]. JOURNAL DE CHIMIE PHYSIQUE ET DE PHYSICO-CHIMIE BIOLOGIQUE, 1991, 88 (7-8) : 1519 - 1544
  • [2] STRUCTURE OF METAL ADLAYERS DURING THE COURSE OF ELECTROCATALYTIC REACTIONS - O-2 REDUCTION ON AU(111) WITH TL ADLAYERS IN ACID-SOLUTIONS
    ADZIC, RR
    WANG, J
    OCKO, BM
    [J]. ELECTROCHIMICA ACTA, 1995, 40 (01) : 83 - 89
  • [3] Influence of organic adsorbates on the under- and overpotential deposition of copper on gold electrodes
    Alonso, C
    Salomón, AB
    Abruña, HD
    [J]. ZEITSCHRIFT FUR PHYSIKALISCHE CHEMIE-INTERNATIONAL JOURNAL OF RESEARCH IN PHYSICAL CHEMISTRY & CHEMICAL PHYSICS, 1999, 210 : 15 - 43
  • [4] BATINA N, 1992, FARADAY DISCUSS, V94, P93
  • [5] Metastable structures in electrodeposited AuCu
    Bozzini, B
    Giovannelli, G
    Natali, S
    [J]. SCRIPTA MATERIALIA, 2000, 43 (10) : 877 - 880
  • [6] Bozzini B, 1999, J APPL ELECTROCHEM, V29, P685
  • [7] Hydrogen incorporation and embrittlement of electroformed Au, Cu and Au-Cu
    Bozzini, B
    Giovannelli, G
    Natali, S
    Brevaglieri, B
    Cavallotti, PL
    Signorelli, G
    [J]. ENGINEERING FAILURE ANALYSIS, 1999, 6 (02) : 83 - 92
  • [8] BOZZINI B, 2000, ELECTROCHEMICAL SOC, V16, P242
  • [9] BOZZINI B, IN PRESS P ECS SPRIN
  • [10] BOZZINI B, 1998, METALL ITAL, V90, P23