Magnetoresistance in Pr0.65Ba0.05Ca0.3Mn3-delta thin films

被引：16

作者：

Kumar, D ^{[1
]}

Singh, RK ^{[1
]}

Lee, CB ^{[1
]}

机构：

[1] N CAROLINA AGR & TECH STATE UNIV, DEPT ELECT ENGN, GREENSBORO, NC 27411 USA

来源：

PHYSICAL REVIEW B | 1997年 / 56卷 / 21期

关键词：

D O I：

10.1103/PhysRevB.56.13666

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Interesting magnetotransport behavior has been observed in Pr0.65Ba0.05Ca0.3MnO3-delta films. The films are grown in situ on (100) LaAlO3 substrates using a pulsed-laser-deposition technique. Microstructural characterization carried out on these films has shown that the films are smooth, free from impurity phases, and highly textured. The electrical resistance and magnetoresistance (MR) have been measured in the 10-300 K range in magnetic field up to 5 T using a SQUID magnetometer. With the application of magnetic fields of 0.5 and 5 T, the resistance of the films has been found to drop spectacularly, resulting in the realization of MR ratios (at similar to 60 K) as high as 5.3x10(3) and 5.6x10(8), respectively.

引用

页码：13666 / 13668

页数：3

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