Metal-semiconductor-metal UV photodetector based on Ga doped ZnO/graphene interface

被引:19
作者
Kumar, Manoj [1 ,2 ,3 ]
Noh, Youngwook [1 ]
Polat, Kinyas [2 ,3 ]
Okyay, Ali Kemal [2 ,3 ]
Lee, Dongjin [1 ]
机构
[1] Konkuk Univ, Sch Mech Engn, Seoul 143701, South Korea
[2] Bilkent Univ, UNAM Natl Nanotechnol Res Ctr, TR-06800 Ankara, Turkey
[3] Bilkent Univ, Inst Mat Sci & Nanotechnol, TR-06800 Ankara, Turkey
基金
新加坡国家研究基金会;
关键词
Ga doped ZnO; Graphene; Metal-semiconductor-metal; Surface plasmon;
D O I
10.1016/j.ssc.2015.10.007
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Fabrication and characterization of metal-semiconductor-metal (MSM) ultraviolet (UV) photodetector (PD) based on Ga doped ZnO (ZnO:Ga)/graphene is presented in this work. A low dark current of 8.68 nA was demonstrated at a bias of 1 V and a large photo to dark contrast ratio of more than four orders of magnitude was observed. MSM PD exhibited a room temperature responsivity of 48.37 A/W at wavelength of 350 nm and UV-to-visible rejection ratio of about three orders of magnitude. A large photo-to-dark contrast and UV-to-visible rejection ratio suggests the enhancement in the PD performance which is attributed to the existence of a surface plasmon effect at the interface of the ZnO:Ga and underlying graphene layer. (C) 2015 Elsevier Ltd. All rights reserved.
引用
收藏
页码:37 / 40
页数:4
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