Characterization and application of HfO2 - SiO2 mixtures produced by ion-beam sputtering technology

被引：4

作者：

Kicas, Simonas ^{[1
]}

Bataviciute, Gintare ^{[2
]}

Juskevicius, Kestutis ^{[1
]}

Tolenis, Tomas ^{[1
]}

Drazdys, Ramutis ^{[1
]}

Buzelis, Rytis ^{[1
]}

Melninkaitis, Andrius ^{[2
]}

机构：

[1] Ctr Phys Sci & Technol, Savanoriu Ave 231, LT-02300 Vilnius, Lithuania

[2] Vilnius Univ, Ctr Laser Res, LT-10223 Vilnius, Lithuania

来源：

LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 2013 | 2013年 / 8885卷

关键词：

Oxide mixtures; laser damage threshold; ion beam sputtering; mirrors; hafnium oxide; UV; STRESS;

D O I：

10.1117/12.2030308

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

In the past years the usage of mixed oxides coatings lead to an important improvement of laser damage threshold and quality of optical elements. In this study influence of post treatment procedure - ex-situ annealing - is examined in terms of quality, optical constants and laser induced damage threshold (LIDT) of mixed HfO2 and SiO2 coatings. Monolayer thin films containing different fractions of HfO2 are deposited with ion beam sputtering technology (IBS.) All samples are post annealed at different temperatures and optimal regimes are defined. Refractive index and absorption coefficient dispersion is evaluated from transmission spectra measurements. Surface roughness of all samples is characterized before and after deposition and annealing, using atomic force microscopy (AFM). Microstructural changes are identified from changes in surface topography. Further, optical resistance was characterized by 5.7 ns duration pulses for 355 nm wavelength laser radiation, performing 1-on-1 sample exposure tests with high resolution micro-focusing approach for monolayer samples and S-on-1 tests for multilayer reflectors. Morphology of damaged sites was analyzed through optical microscopy. Finally, conclusions about annealing effect for mixed HfO2 and SiO2 monolayer and multilayer coatings are made.

引用

页数：7

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