Microwave Plasma Process for SiCN:H Thin Films Synthesis with Composition Varying from SiC:H to SiN:H in H2/N2/Ar/Hexamethyldisilazane Gas Mixture

被引:15
作者
Belmahi, Mohammed [1 ,2 ]
Bulou, Simon [3 ,4 ,5 ]
Thouvenin, Amanda [1 ,2 ]
de Poucques, Ludovic [1 ,2 ]
Hugon, Robert [1 ,2 ]
Le Brizoual, Laurent
Miska, Patrice [1 ,2 ]
Geneve, Damien [1 ,2 ]
Vasseur, Jean-Luc [1 ,2 ]
Bougdira, Jamal [1 ,2 ]
机构
[1] Univ Lorraine, Inst Jean Lamour UMR 7198, Fac Sci & Technol, F-54506 Vandoeuvre Les Nancy, France
[2] CNRS, Inst Jean Lamour UMR 7198, Fac Sci & Technol, F-54506 Vandoeuvre Les Nancy, France
[3] Ctr Rech Publ Gabriel Lippmann, L-4422 Belvaux, Luxembourg
[4] Univ Nantes, Inst Mat Jean Rouxel CNRS UMR 6502, F-44322 Nantes 3, France
[5] Univ Rennes 1, UMR CNRS 6164, Inst Elect & Telecommun Rennes, F-35042 Rennes, France
关键词
chemical composition; microwave plasma assisted chemical vapour deposition; organosilicon compound; optical constants; SiCN thin films; CHEMICAL-VAPOR-DEPOSITION; SILICON CARBONITRIDE FILMS; C-N FILMS; OPTICAL-PROPERTIES; H FILMS; (DIMETHYLAMINO)DIMETHYLSILANE PRECURSOR; TETRAMETHYLDISILAZANE SOURCE; SURFACE PASSIVATION; SICXNY FILMS; NITRIDE;
D O I
10.1002/ppap.201300166
中图分类号
O59 [应用物理学];
学科分类号
摘要
SiCxNy:H thin films are obtained with the microwave plasma assisted chemical vapour deposition (MPACVD) method in the gas mixture H2/Ar/Hexamethyldisilazane. When very few amounts of nitrogen are added to the gas mixture, the film composition changes drastically from SiCx:H like films to SiNx:H like films, according to X-rays Photoelectron Spectroscopy and Fourier Transform Infra-Red Spectroscopy (FTIR) analysis. The refractive index (n) and Tauc's optical gap (Eg) are modified over a wide range of values (1.75n2.15 and 3.5eVEg5eV) with nitrogen addition to the feed gas leading to thin films optical constants close to those of SiC or Si3N4. Therefore, for the films obtained without nitrogen, SiC nanoparticles with a size of about 20nm embedded in an amorphous SiCN:H matrix are synthesized, leading to nanocomposite films.
引用
收藏
页码:551 / 558
页数:8
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