Perspective on the switching behavior of HfO2-based ferroelectrics

被引:23
作者
Wang, Chenxi [1 ,2 ]
Qiao, Huimin [1 ,2 ]
Kim, Yunseok [1 ,2 ]
机构
[1] Sungkyunkwan Univ SKKU, Sch Adv Mat Sci & Engn, Suwon 16419, South Korea
[2] Sungkyunkwan Univ SKKU, Res Ctr Adv Mat Technol, Suwon 16419, South Korea
基金
新加坡国家研究基金会;
关键词
FIELD-CYCLING BEHAVIOR; THIN-FILMS; WAKE-UP; NEGATIVE CAPACITANCE; ELECTRIC-FIELD; POLARIZATION; DYNAMICS; ENDURANCE; MECHANISMS; SIMULATION;
D O I
10.1063/5.0035652
中图分类号
O59 [应用物理学];
学科分类号
摘要
Since ferroelectricity was first observed in 2011, HfO2-based ferroelectrics have garnered significant attention, owing to their compatibility with complementary metal-oxide-semiconductors. Moreover, their thickness scalability facilitates the miniaturization of integrated circuit systems. The ultrafast polarization switching speed in the range of sub-nanoseconds helps in the fabrication of fast-operation devices. The origins of ferroelectricity in HfO2-based ferroelectrics differ from those of conventional perovskite ferroelectrics, with more complex behaviors associated with polarization switching. In this Perspective, recent investigations on the complex behaviors pertaining to polarization switching, including wake-up, split-up, fatigue, negative capacitance, accumulative switching, and some of their relations are discussed. Furthermore, the polarization switching dynamics have also been studied. Finally, the potential applications and investigations of HfO2-based ferroelectrics are discussed.
引用
收藏
页数:13
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共 104 条
  • [51] Endurance properties of silicon-doped hafnium oxide ferroelectric and antiferroelectric-like thin films: A comparative study and prediction
    Liu, Xiaohua
    Zhou, Dayu
    Guan, Yan
    Li, Shuaidong
    Cao, Fei
    Dong, Xianlin
    [J]. ACTA MATERIALIA, 2018, 154 : 190 - 198
  • [52] TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
    Lomenzo, Patrick D.
    Takmeel, Qanit
    Zhou, Chuanzhen
    Fancher, Chris M.
    Lambers, Eric
    Rudawski, Nicholas G.
    Jones, Jacob L.
    Moghaddam, Saeed
    Nishida, Toshikazu
    [J]. JOURNAL OF APPLIED PHYSICS, 2015, 117 (13)
  • [53] Local phase decomposition as a cause of polarization fatigue in ferroelectric thin films
    Lou, X. J.
    Zhang, M.
    Redfern, S. A. T.
    Scott, J. F.
    [J]. PHYSICAL REVIEW LETTERS, 2006, 97 (17)
  • [54] Polarization fatigue in ferroelectric thin films and related materials
    Lou, X. J.
    [J]. JOURNAL OF APPLIED PHYSICS, 2009, 105 (02)
  • [55] Stretched exponential relaxation in perovskite ferroelectrics after cyclic loading
    Lupascu, DC
    Fedosov, S
    Verdier, C
    Rödel, J
    von Seggern, H
    [J]. JOURNAL OF APPLIED PHYSICS, 2004, 95 (03) : 1386 - 1390
  • [56] Robust ferroelectricity in epitaxial Hf1/2Zr1/2O2 thin films
    Lyu, J.
    Fina, I.
    Solanas, R.
    Fontcuberta, J.
    Sanchez, F.
    [J]. APPLIED PHYSICS LETTERS, 2018, 113 (08)
  • [57] High polarization, endurance and retention in sub-5 nm Hf0.5Zr0.5O2 films
    Lyu, Jike
    Song, Tingfeng
    Fina, Ignasi
    Sanchez, Florencio
    [J]. NANOSCALE, 2020, 12 (20) : 11280 - 11287
  • [58] Epitaxial Integration on Si(001) of Ferroelectric Hf0.5Zr0.5O2 Capacitors with High Retention and Endurance
    Lyu, Jike
    Fina, Ignasi
    Fontcuberta, Josep
    Sanchez, Florencio
    [J]. ACS APPLIED MATERIALS & INTERFACES, 2019, 11 (06) : 6224 - 6229
  • [59] Lyu X, 2020, IEEE SILICON NANOELE, P7, DOI [10.1109/snw50361.2020.9131420, 10.1109/SNW50361.2020.9131420]
  • [60] Polarization behavior of poly(vinylidene fluoride-trifluoroethylene) copolymer ferroelectric thin film capacitors for nonvolatile memory application in flexible electronics
    Mao, D.
    Mejia, I.
    Stiegler, H.
    Gnade, B. E.
    Quevedo-Lopez, M. A.
    [J]. JOURNAL OF APPLIED PHYSICS, 2010, 108 (09)