Kinetics of tertiarybutylphosphine adsorption and phosphorus desorption from indium phosphide (001)

被引：13

作者：

Sun, Y ^{[1
]}

Law, DC ^{[1
]}

Visbeck, SB ^{[1
]}

Hicks, RF ^{[1
]}

机构：

[1] Univ Calif Los Angeles, Dept Chem Engn, Los Angeles, CA 90095 USA

来源：

SURFACE SCIENCE | 2002年 / 513卷 / 02期

基金：

美国国家科学基金会;

关键词：

indium phosphide; surface chemical reaction;

D O I：

10.1016/S0039-6028(02)01819-8

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The kinetics of tertiarybutylphosphine adsorption and phosphorus desorption from indium phosphide (0 0 1) have been determined using reflectance difference spectroscopy for real-time monitoring of the phosphorus coverage. The precursor adsorption rate depends linearly on the coverage, and the initial sticking coefficient varies from 0.007 to 0.001 as the temperature increases from 420 to 520 degreesC. The phosphorus desorption rate is first order in the coverage and exhibits an activation energy and pre-exponential factor of 2.4 +/- 0.2 eV and 10(14.7 + 1.5) s(-1). These reaction kinetics play an important role in the growth of phosphide-based alloys by metalorganic vapor-phase epitaxy. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：256 / 262

页数：7

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