Abnormally high recovery strain in Ti-Ni-based shape memory alloys

被引:16
作者
Ryklina, E. P. [1 ]
Prokoshkin, S. D. [1 ]
Kreytsberg, A. Yu. [1 ]
机构
[1] Natl Univ Sci & Technol MISIS, Moscow 119049, Russia
关键词
Shape memory alloys; Nitinol; Thermomechanical treatment; Microstructure; Recovery strain; Two-way shape memory effect;
D O I
10.1016/j.jallcom.2012.02.138
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
This paper focuses on the study of the shape memory effect (SME) and two-way SME (TWSME) in Ti-50.0 at.%Ni and Ti-50.7 at.%Ni alloys (wire with the diameter 0.3 mm) with different types of initial austenite structure: initial polygonisation, nanosubgrained structure, recrystallised structure with grain size of about 5 pm and their mixture (annealing after moderate deformation with true strain e approximate to 0.6). A homogenising annealing at 700 degrees C, for 20 min served as a reference heat treatment (recrystallised structure of austenite). Post-deformation annealing was performed in the temperature range 250-600 degrees C for 0.5-1 h. The SME training procedure was carried out in a bending under load through B2 -> R -> B19' transformation with the constrained strain epsilon(t) in the range of 11-18%. The initial structure and constrained strain strongly affect all studied SME and TWSME parameters. A combined effect of recrystallised structure with grain size of about 5 mu m obtained after 600 degrees C, I h annealing after low-temperature thermomechanical treatment (LTMT) and 18% loading (total) strain brought the highest recovery strain epsilon(r) = 16.6% in Ti-50.7 at.%Ni alloy. The maximum recovery strain in Ti-50.0%Ni alloy (epsilon(r) =10.4%) was provoked by the mixed structure (polygonised and recrystallised) obtained after 450 degrees C, 30 min annealing after LTMT. The variation of training parameters enabled additional precise regulation of functional properties. The obtained results can be used for development elements functioning in conditions of the SME and TWSME realisation. (C) 2012 Elsevier B.V. All rights reserved.
引用
收藏
页码:S255 / S258
页数:4
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