Electrical characteristics of inductively coupled plasma using single langmuir probe

被引:0
作者
Choi, YS
Lee, YH
Park, CS
Hwang, MK
Park, DH
机构
[1] Wonkwang Univ, Iksan 570749, South Korea
[2] Korea Inst Lighting Technol, Seoul 121220, South Korea
来源
LIGHT SOURCES 2004 | 2004年 / 182期
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D O I
暂无
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
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页码:255 / 256
页数:2
相关论文
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[4]   PULSE-TIME-MODULATED ELECTRON-CYCLOTRON-RESONANCE PLASMA-ETCHING FOR HIGHLY SELECTIVE, HIGHLY ANISOTROPIC, AND NOTCH-FREE POLYCRYSTALLINE SILICON PATTERNING [J].
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