GHz response of metamorphic InAlAs metal-semiconductor-metal photodetector on GaAs substrate

被引:1
作者
Maekita, Kazuaki [1 ]
Maruyama, Takeo [1 ]
Iiyama, Koichi [1 ]
Suzuki, Toshi-kazu [2 ]
机构
[1] Kanazawa Univ, Grad Sch Nat Sci & Technol, Kanazawa, Ishikawa 9201192, Japan
[2] Japan Adv Inst Sci & Technol, Ctr Nano Mat & Technol, Nomi, Ishikawa 9231292, Japan
基金
日本科学技术振兴机构;
关键词
QUANTUM-WELL LASERS; BUFFER LAYERS; TRANSISTORS; INXGA1-XAS; GROWTH;
D O I
10.7567/JJAP.53.02BC16
中图分类号
O59 [应用物理学];
学科分类号
摘要
We fabricated metal-semiconductor metal (MSM) photodetectors on the metamorphic InAlAs layer grown on a GaAs substrate. The devices were measured at a wavelength in the 0.8 mu m regime. The receiving area is 30 x 30 mu m(2) and the electrode spacings are 2, 1, and 0.4 mu m. At the electrode spacing of 1 mu m, a dark current of 125 nA was obtained at a bias voltage of -15 V. At a wavelength of 830 nm, a responsivity of 0.13 A/W was obtained at a bias voltage of -15 V. At a wavelength of 850 nm, the maximum bandwidth of 9 GHz was obtained at a bias voltage of -15 V. (C) 2014 The Japan Society of Applied Physics
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页数:5
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