Fractional van der Waals interaction between thin metallic films

被引:75
作者
Boström, M [1 ]
Sernelius, BE [1 ]
机构
[1] Linkoping Univ, Dept Phys & Measurement Technol, S-58183 Linkoping, Sweden
来源
PHYSICAL REVIEW B | 2000年 / 61卷 / 03期
关键词
D O I
10.1103/PhysRevB.61.2204
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The van der Waals (vdW) interaction between thin metallic films varies with separation as the separation to a fractional power. This is in contrast to the usual integer-power separation dependence between objects such as atoms, dielectric films, or thick metallic films. We have calculated the free energy of attraction between sheets of gold, silver, copper, beryllium, and tungsten numerically using experimentally found dielectric functions. The results are compared with the corresponding analytical results obtained using simple model dielectric functions. We have investigated how thin the metallic films must be in order for the fractional vdW interaction to be present. To our knowledge, fractional vdW interaction has not yet been confirmed experimentally.
引用
收藏
页码:2204 / 2210
页数:7
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